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Fabrication of Electrical Nanocontacts to Nanometer-sized materials and Structures Using a Focused Ion Beam

Published online by Cambridge University Press:  01 February 2011

F. Hernández-Ramírez
Affiliation:
Department of Electronics, University of Barcelona, Martí i Franquès 1, E-08028, Barcelona, Spain
O. Casals
Affiliation:
Department of Electronics, University of Barcelona, Martí i Franquès 1, E-08028, Barcelona, Spain
J. Rodríguez
Affiliation:
Department of Electronics, University of Barcelona, Martí i Franquès 1, E-08028, Barcelona, Spain
A. Vilà
Affiliation:
Department of Electronics, University of Barcelona, Martí i Franquès 1, E-08028, Barcelona, Spain
A. Romano-Rodríguez
Affiliation:
Department of Electronics, University of Barcelona, Martí i Franquès 1, E-08028, Barcelona, Spain
J.R. Morante
Affiliation:
Department of Electronics, University of Barcelona, Martí i Franquès 1, E-08028, Barcelona, Spain
M. Abid
Affiliation:
Ångströmlaboratoriet, Universitet Uppsala, Lägerhyddsvägen 1, SE-751 21 Uppsala, Sweden
S. Valizadeh
Affiliation:
Laboratoire de Physique des Matériaux Nanostructurés, École Polytechnique Fédérale de Lausanne, EPFL, CH-1015 Lausanne, Switzerland
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Abstract

A Dual Beam Focused Ion Beam (FIB) machine has been used to deposit platinum contacts on different nanostructured materials using both electron- and ion-assisted deposition. The electrical quality of the deposited platinum has been studied, and the feasibility of using this nanofabrication method to extract electrical parameters of nanomaterials demonstrated. The advantage of combining electron- and ion-assisted deposition instead of using only ion-assisted deposition is discussed. The possibility of applying this method in the fabrication of future nanodevices is demonstrated in a gas nanosensor prototype.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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