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Fabrication and Electrical Studies of P(VDF/TrFE)(72/28) Copolymer based Non-Volatile Memory Devices as a Function of Varying Device Structures

Published online by Cambridge University Press:  01 February 2011

Kap Jin Kim
Affiliation:
[email protected], Kyung Hee University, Advanced Polymer and Fiber Materials, Seocheon-dong 1, Gigeung-gu, Yongin, 446-701, Korea, Republic of, +82-31-201-2518, +82-31-204-8114
Chang Woo Choi
Affiliation:
[email protected], Kyung Hee University, Advanced Polymer and Fiber Materials, 1 Seocheon-dong, Giheung-gu, Yongin, Gyeonggi-do, 446-701, Korea, Republic of
Arun Anand Prabu
Affiliation:
[email protected], Kyung Hee University, Advanced Polymer and Fiber Materials, 1 Seocheon-dong, Giheung-gu, Yongin, Gyeonggi-do, 446-701, Korea, Republic of
Sun Yoon
Affiliation:
[email protected], Kyung Hee University, Advanced Polymer and Fiber Materials, 1 Seocheon-dong, Giheung-gu, Yongin, Gyeonggi-do, 446-701, Korea, Republic of
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Abstract

Ferroelectric characteristics of poly(vinylidiene fluoride/trifluoroethylene) (P(VDF/TrFE) (72/28 mol%)) copolymer ultrathin films used as an insulator in varying memory device architectures such as metal-ferroelectric polymer-metal (MFM), MF-insulator-semiconductor (MFIS), MIS and organic field-effect transistor (OFET) were studied using different electrical measurements. A maximum data writing speed of 1.69 MHz was calculated from the switching time measured using MFM architecture. Capacitance-voltage measured using MFIS was found to be more suitable for distinguishing the ‘0’ and ‘1’ state compared to MFM device structure. In OFET, the decreasing channel length increased the measured drain current (Id) values as well as its memory window enabling easier identification of the ‘0’ and ‘1’ state comparable to MFIS case. The data obtained from this study will be useful in the fabrication of non-volatile random access memory (NVRAM) devices with faster data R/W/E speed and memory retention capacity.

Type
Research Article
Copyright
Copyright © Materials Research Society 2008

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