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Evidence for Laser Induced Surface Silanol Formation

Published online by Cambridge University Press:  15 February 2011

D. F. Muller ,
M. Rothschild  and
C. K. Rhodes
D. F. Muller
Affiliation:
Department of Physics, University of Illinois at Chicago, Chicago, Illinois 60680
M. Rothschild
Affiliation:
Department of Physics, University of Illinois at Chicago, Chicago, Illinois 60680
C. K. Rhodes
Affiliation:
Department of Physics, University of Illinois at Chicago, Chicago, Illinois 60680
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Abstract

Evidence for the selective formation of surface silanol induced by ultraviolet irradiation in the intensity range between 3 × 107 W/cm2 and 108 W/cm2 is presented. Enhanced metallic deposition (Ti) on appropriately prepared samples is also reported.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 17: Symposium I – Laser Diagnostics and Photochemical Processing for Semiconductor Devices , 1982 , 135
Copyright
Copyright © Materials Research Society 1983

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References

REFERENCES

1. Wilson, C. G. and Moreau, W. M., Tutorial Session, Fundamentals of Polymeric Resist Materials, SPIE Conference on Microlithography, Santa Clara, Calif., March 28, 1982.Google Scholar