Hostname: page-component-78c5997874-dh8gc Total loading time: 0 Render date: 2024-11-09T19:53:06.501Z Has data issue: false hasContentIssue false
  • English
  • Français

Evaporative Deposition of Aluminum Single Crystals

Published online by Cambridge University Press:  11 February 2011

Alan Jankowski ,
Bob Vallier ,
Ann Bliss  and
Jeffrey Hayes
Alan Jankowski
Affiliation:
Chemistry & Materials Science, Lawrence Livermore National Laboratory, Livermore CA 94551–9900, U.S.A.
Bob Vallier
Affiliation:
Chemistry & Materials Science, Lawrence Livermore National Laboratory, Livermore CA 94551–9900, U.S.A.
Ann Bliss
Affiliation:
Chemistry & Materials Science, Lawrence Livermore National Laboratory, Livermore CA 94551–9900, U.S.A.
Jeffrey Hayes
Affiliation:
Mechanical Engineering, Lawrence Livermore National Laboratory, Livermore CA 94551–9900, U.S.A.
Get access

Abstract

The classic zone model for growth of evaporated deposits serves a starting point for selecting the process conditions to produce dense crystalline coatings. The columnar structure intrinsic to vapor deposits evolves from the nano-to-millimeter scale as the substrate temperature increases to the melting point. In this paper, the deposition conditions are reviewed for the evolution of a single crystal structure in metal coatings. Experimental results are presented for the electron-beam deposition of aluminum coatings up to 100 μm in thickness. The deposition of a single crystal occurs when the coating temperature exceeds 530 °C, i.e. 85% of the absolute melt point.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 749: Symposium W – Morphological and Compositional Evolution of Thin Films , 2002 , W11.3
Copyright
Copyright © Materials Research Society 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Lorenz, K.T., Kalantar, D., Edwards, J., Colvin, J.D., Reisman, D.B., and Remington, B., Bull. Am. Phys. Soc. 46 (8), 44 (2001).Google Scholar
2. Movchan, B.A., and Demchishin, A.V., Phys. Met. Metallogr. 28, 83 (1969).Google Scholar
3. Bunshah, R.F., J. Vac. Sci. Technol. 11, 633 (1974).Google Scholar
4. Thornton, J.A., J. Vac. Sci. Technol. A 4, 3059 (1986).Google Scholar
5. Hilliard, J.E., Metal Progr. 85, 99 (1964).Google Scholar
6. Jankowski, A.F., and Shewbridge, J.F., Mater. Lett. 4, 313 (1986).Google Scholar
7. Reed-Hill, R.E., Physical Metallurgy Principles (Van Nostrand, New York, 1973) pp. 304–310.Google Scholar