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Etching Reactions at Solid Surfaces

Published online by Cambridge University Press:  21 February 2011

Harold F. Winters  and
J. W. Coburn
Harold F. Winters
Affiliation:
IBM Research Laboratory, San Jose, California 95193
J. W. Coburn
Affiliation:
IBM Research Laboratory, San Jose, California 95193
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Abstract

An understanding of etching reactions in a plasma environment requires a knowledge of: (1) the types of gas phase particles which react at the surface, (2) the etch products formed, and (3) the processes which lead from reactants to products. Experimental data relavant to these topics are reviewed in this paper. A conceptual framework for understanding the etching reaction is reviewed and it is shown that the experimental data presently available is consistent with this framework. The influence of ion bombardment on etching reactions is extensively discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 38: Symposium F – Plasma Synthesis and Etching of Electronic Materials , 1984 , 189
Copyright
Copyright © Materials Research Society 1985

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