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Enhancement of Field Emission Current from ZnO Nanorods Fabricated by Two Step Chemical Vapor Deposition with Laser Ablation of ZnO

Published online by Cambridge University Press:  01 February 2011

Takashi Hirate ,
Takashi Kimpara ,
Kazumoto Takizawa  and
Tomomasa Satoh
Takashi Hirate
Affiliation:
[email protected], Kanagawa University, Electronics and Informatics Frontiers, 3-27-1 Rokkakubashi, Kanagawa-ku, Yokohama, 221-8686, Japan, +81-45-481-5661, +81-45-491-7915
Takashi Kimpara
Affiliation:
[email protected], Kanagawa University, Electronics and Informatics Frontiers, 3-27-1 Rokkakubashi, Kanagawa-ku, Yokohama, 2218686, Japan
Kazumoto Takizawa
Affiliation:
[email protected], Kanagawa University, Electronics and Informatics Frontiers, 3-27-1 Rokkakubashi, Kanagawa-ku, Yokohama, 2218686, Japan
Tomomasa Satoh
Affiliation:
[email protected], Kanagawa University, Electronics and Informatics Frontiers, 3-27-1 Rokkakubashi, Kanagawa-ku, Yokohama, 2218686, Japan
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Abstract

We fabricated well-aligned ZnO nanorods with thin diameter by two-step chemical vapor deposition method combined with laser ablation of a sinterd ZnO target. Firstly, well-aligned ZnO nanorods with thick diameter of about 110 nm are grown on an n-Si (111) wafer. Next, a thin ZnO nanorod with about 30 nm diameter is grown on the center of the flat tip of each well-aligned and thick ZnO nanorod by controlling a flow rate of oxygen. Although thick ZnO nanorods do not emit a recognizable field emission current, thin ZnO nanorods with 1500 nm length show a field emission current of 500 μA under an electric field of 31 V/μm.

Keywords

field emissionnanostructurechemical vapor deposition (CVD) (deposition)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 957: Symposium K – Zinc Oxide and Related Materials , 2006 , 0957-K10-38
Copyright
Copyright © Materials Research Society 2007

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References

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