Hostname: page-component-586b7cd67f-t8hqh Total loading time: 0 Render date: 2024-11-20T09:20:27.285Z Has data issue: false hasContentIssue false

Electrical Transport Mechanisms in p+a-SiC:H/n c-Si Heterojunctions: dark J-V-T Characteristics

Published online by Cambridge University Press:  10 February 2011

M. W. M van Cleef
Affiliation:
Debye Institute, Dept of Atomic & Interface Physics, Utrecht University, P.O.Box 80000, NL-3508 TA, Utrecht, the Netherlands.
M. W. H. Philippens
Affiliation:
Debye Institute, Dept of Atomic & Interface Physics, Utrecht University, P.O.Box 80000, NL-3508 TA, Utrecht, the Netherlands.
F. A. Rubinelli
Affiliation:
Debye Institute, Dept of Atomic & Interface Physics, Utrecht University, P.O.Box 80000, NL-3508 TA, Utrecht, the Netherlands.
M. Kolter
Affiliation:
Debye Institute, Dept of Atomic & Interface Physics, Utrecht University, P.O.Box 80000, NL-3508 TA, Utrecht, the Netherlands.
R. E. I. Schropp
Affiliation:
Debye Institute, Dept of Atomic & Interface Physics, Utrecht University, P.O.Box 80000, NL-3508 TA, Utrecht, the Netherlands.
Get access

Abstract

In the present paper we show results of dark current-voltage measurements performed on p+ a- SiC:H/n c-Si heterojunction diodes at various temperatures (100–400K). We investigated the voltage derivative of these J-V curves in order to the distinguish possible current transport mechanisms. It was found that for low temperatures (<300K), the current is determined by recombination of carriers in the crystalline silicon, whereas at high temperature (>300 K), by a tunnelling mechanism. At room temperature, both mechanisms contribute to the current. By using an equivalent circuit model and detailed numerical simulations we have interpreted our experimental characteristics. The simulations done at room temperature, show that at low forward bias voltage the current is controlled by recombination in the crystalline silicon and that at high forward bias voltage by a combination of multi-step tunnelling and a-SiC:H series resistance. For interface state densities equal to or higher than 1012 cm−2, the recombination was found to be dominated by the states at the amorphous-crystalline silicon interface.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Sawada, T. et al. , Proceedings of the 1st WCPEC 1994 Hawaii (USA), 12191226 (1994)Google Scholar
[2] van Cleef, M.W.M. et al. , Proceeding of the 13th EPSEC 1995 Nice (France), 1303–1306 (1995)Google Scholar
[3] Matsuura, H. et al. , J. Appl. Phys. 55 (4), 10121019 (1984)Google Scholar
[4] Sala, D. della et al. , Proceeding of the 13th EPSEC 1995 Nice (France), 906910, (1995)Google Scholar
[5] Rahman, M. Mahmudur et al. , Jap. J. of Appl. Phys. 23 (5), 515524, (1984)Google Scholar
[6] McElheley, P.M. et al. , J.Appl. Phys. 64, 1254 (1988)Google Scholar