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Effects of substrates roughness on c-axis preferred orientation of ZnO films deposited by rf magnetron sputtering

Published online by Cambridge University Press:  21 March 2011

Jae Bin Lee ,
Sanghyon Kwack  and
Hyeong Joon Kim
Jae Bin Lee
Affiliation:
School of Material Science & Engineering, Seoul National University, Seoul 151-742, Korea
Sanghyon Kwack
Affiliation:
School of Material Science & Engineering, Seoul National University, Seoul 151-742, Korea
Hyeong Joon Kim
Affiliation:
School of Material Science & Engineering, Seoul National University, Seoul 151-742, Korea
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Abstract

We investigated the effect of substrate surface roughness on c-axis preferred orientation of ZnO films deposited by radio frequency (rf) magnetron sputtering. We used as substrates a bare Si(100), evaporated Au/Si(100), evaporated Al/Si(100), and sputtered Al/Si(100), of which rms roughness by atomic force microscope (AFM) were 0.127, 1.71, 2.11, and 6.5∼11.8 nm, respectively. The crystallinity and the c-axis preferred orientation of ZnO films strongly depended on the surface roughness of the used substrates.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 672: Symposium O – Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures , 2001 , O8.20
Copyright
Copyright © Materials Research Society 2001

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References

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