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Effects of Silica Sources on Nanoporous Organosilicate Films Templated with Tetraalkylammonium Cations

Published online by Cambridge University Press:  31 January 2011

Salvador Eslava ,
Jone Urrutia ,
Abheesh N. Busawon ,
Mikhail R. Baklanov ,
Francesca Iacopi ,
Karen Maex ,
Christine E. A. Kirschhock  and
Johan A. Martens
Salvador Eslava
Affiliation:
[email protected]@hotmail.com, IMEC, Leuven, Belgium
Jone Urrutia
Affiliation:
[email protected], IMEC, Leuven, Belgium
Abheesh N. Busawon
Affiliation:
[email protected], Imperial College London, London, United Kingdom
Mikhail R. Baklanov
Affiliation:
[email protected], IMEC, Leuven, Belgium
Francesca Iacopi
Affiliation:
[email protected], IMEC, Leuven, Belgium
Karen Maex
Affiliation:
[email protected], IMEC, Leuven, Belgium
Christine E. A. Kirschhock
Affiliation:
[email protected], Katholieke Universiteit Leuven, Centrum voor Oppervlaktechemie en Katalyse, Leuven, Belgium
Johan A. Martens
Affiliation:
[email protected], Katholieke Universiteit Leuven, Centrum voor Oppervlaktechemie en Katalyse, Leuven, Belgium
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Abstract

Nanoporous organosilicate films have been recently prepared using tetraalkylammonium cations in acid and basic media, outperforming other materials. Resulting films using basic medium were called zeolite-inspired low-k dielectrics. Here we study the dependence of the properties of these films on the used silica sources: methyltrimethoxy silane (MTMS) and tetraethyl orthosilicate (TEOS). A set of experiments varying the MTMS:TEOS ratio were prepared in acid medium and characterized. A textural, physico-chemical, mechanical, and electrical characterization of this series of experiments is presented.

Keywords

dielectricsol-gelthin film
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1156: Symposium D – Materials, Processes and Reliability for Advanced Interconnects for Micro-and Nanoelectronics–2009 , 2009 , 1156-D03-01
Copyright
Copyright © Materials Research Society 2009

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