Hostname: page-component-586b7cd67f-t7fkt Total loading time: 0 Render date: 2024-11-25T17:43:41.171Z Has data issue: false hasContentIssue false
  • English
  • Français

The Effects of Ion Energy on Carbon and Tungsten Films Fabricated by Direct Ion Beam Deposition and Ion Beam Sputtering Deposition

Published online by Cambridge University Press:  16 February 2011

I. Kataoka ,
K. Ito ,
N. Hoshi ,
T. Yonemitsu ,
K. Etoh ,
I. Yamada  and
Jean-Jacques Delaunay
I. Kataoka
Affiliation:
Japan Aviation Electronics Industry, Ltd., 1–1, Musashino 3-chome, Akishimashi, Tokyo, 196, Japan
K. Ito
Affiliation:
Japan Aviation Electronics Industry, Ltd., 1–1, Musashino 3-chome, Akishimashi, Tokyo, 196, Japan
N. Hoshi
Affiliation:
Japan Aviation Electronics Industry, Ltd., 1–1, Musashino 3-chome, Akishimashi, Tokyo, 196, Japan
T. Yonemitsu
Affiliation:
Japan Aviation Electronics Industry, Ltd., 1–1, Musashino 3-chome, Akishimashi, Tokyo, 196, Japan
K. Etoh
Affiliation:
Japan Aviation Electronics Industry, Ltd., 1–1, Musashino 3-chome, Akishimashi, Tokyo, 196, Japan
I. Yamada
Affiliation:
Japan Aviation Electronics Industry, Ltd., 1–1, Musashino 3-chome, Akishimashi, Tokyo, 196, Japan
Jean-Jacques Delaunay
Affiliation:
Université Louis Pasteur, Ecole Nationale Supérieure de Physique de Strasbourg, Strasbourg, France
Get access

Abstract

The x-ray reflectivity and surface morphology of C/W multilayers fabricated by ion beam sputtering (IBS) method was evaluated. Also the surface roughness and amorphous structure of C and W films fabricated by direct ion beam deposition (DIBD) method were evaluated as a function of ion energy. The reflectivity was measured by the C-K line (4.47nm) and STM was used for surface roughness measurement and root-mean-square value of correlation function of the RHEED pattern was used for evaluation of amorphous structure. The reflectivity of C/W multilayer was about 69% of the theoretical one, and micro-columnar structures were observed from STM images. The film structure and surface roughness of DIBD film were changed with the depositing ion energy. The surface roughness of films becomes smaller as the depositing energy becomes higher in the energy range from 20 to 140eV.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 223: Symposium E – Low Energy Ion Beam and Plasma Modification of Materials , 1991 , 359
Copyright
Copyright © Materials Research Society 1991

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Houdy, Ph., Bodart, V., Hily, C., Ruterana, P., Nevot, L., Arbaoui, M., Alehyane, N., and Barchewitz, R., Proceedings of SPIE 733(1986)389 Google Scholar
2. Kataoka, I., Yonemitsu, T., Sekine, K., Yamada, I., Etoh, K., Ito, K. and Hoshi, N. in Beam-Solid Interactions: Physical Phenomena edited by Knapp, J. A., Borgesen, P. and Zuhr, P. A. (Mat. Res. Soc. Symp. Proc. 157 Pittsburgh, PA, 1990) 335 Google Scholar
3. Etoh, K., Kataoka, I., Ito, K. Yonemitsu, T., Hoshi, N., Sekiguchi, H., Yamada, I., Delaunay, J. and Durand, H., Proceedings of SPIE 1546(1991)Google Scholar
4. Kataoka, I., Yamada, I., Eto, K. and Ito, K. in Processing and Characterization of Materials Using Ion Beams edited by Rehn, L. E., Greene, J. and Smidt, F. A.(Mat. Res. Soc. Symp. Proc. 128 Pittsburgh, PA, 1989) 513 Google Scholar
5. Ito, K., Yonemitsu, T., Etoh, K., Sekiguchi, H., Yamada, I. Kataoka, I. and Durand, H., To be published in Nuclear Instruments and Methods, B.(1991).aGoogle Scholar