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Effects of growth temperature on structural properties of ZnO thin films
Published online by Cambridge University Press: 01 February 2011
Abstract
Highly-oriented ZnO thin films have been successfully deposited on (100)Si by metal organic chemical vapor deposition (MOCVD) at 250°C∼400°C. We report on the structural properties of ZnO thin film at various temperatures. The crystallinity of thin films improved and the surface smoothness decreased with increasing growth temperature. In x-ray reflection analysis with respect to ZnO (0002) peak, the full width at half maximum (FWHM) of 0.4°was achieved at 400°.
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- Copyright © Materials Research Society 2002
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