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Effects of Growth Parameters on Surface-morphological, Structural and Electrical Properties of Mo Films by RF Magnetron Sputtering

Published online by Cambridge University Press:  21 March 2011

Shou-Yi Kuo ,
Liann-Be Chang ,
Ming-Jer Jeng ,
Wei-Ting Lin ,
Yong-Tian Lu  and
Sung-Cheng Hu
Shou-Yi Kuo
Affiliation:
Department of Electronic Engineering, Chang Gung University, Green Technology Research Center, Chang Gung University, 259 Wen-Hwa 1st Road, Kweishan, Taoyuan 333, Taiwan Green Technology Research Center, Chang Gung University, 259 Wen-Hwa 1st Road, Kweishan, Taoyuan 333, Taiwan
Liann-Be Chang
Affiliation:
Department of Electronic Engineering, Chang Gung University, Green Technology Research Center, Chang Gung University, 259 Wen-Hwa 1st Road, Kweishan, Taoyuan 333, Taiwan Green Technology Research Center, Chang Gung University, 259 Wen-Hwa 1st Road, Kweishan, Taoyuan 333, Taiwan
Ming-Jer Jeng
Affiliation:
Department of Electronic Engineering, Chang Gung University, Green Technology Research Center, Chang Gung University, 259 Wen-Hwa 1st Road, Kweishan, Taoyuan 333, Taiwan Green Technology Research Center, Chang Gung University, 259 Wen-Hwa 1st Road, Kweishan, Taoyuan 333, Taiwan
Wei-Ting Lin
Affiliation:
Department of Electronic Engineering, Chang Gung University, Green Technology Research Center, Chang Gung University, 259 Wen-Hwa 1st Road, Kweishan, Taoyuan 333, Taiwan Green Technology Research Center, Chang Gung University, 259 Wen-Hwa 1st Road, Kweishan, Taoyuan 333, Taiwan
Yong-Tian Lu
Affiliation:
Chemical Systems Research Division, Chung-Sung institute of Science & Technology
Sung-Cheng Hu
Affiliation:
Chemical Systems Research Division, Chung-Sung institute of Science & Technology
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Abstract

This work reports on the fabrication and characterization of Mo thin films on soda-lime glass substrate grown by reactive RF magnetron sputtering. Film thickness was measured by x-ray step surface profiler. The structural properties and surface morphology were analyzed by x-ray diffraction (XRD), atomic force microscope (AFM) and scanning electron microscopy (SEM). Electrical properties were measured by four-point probe. It was found that the growth parameters, such as argon flow rate, RF power, film thickness, have significant influences on properties of Mo films. The strain on films revealed the complicated relationship with the working pressure, which might be associated with micro structures and impurities. In order to improve the adhesion and electricity, we adopted a two-pressure deposition scheme. The optimal thickness and sheet resistance are νm and 0.12 ω The mechanisms therein will be discussed in detail. Furthermore, we also investigated the diffusion property of Na ion of double Mo films sputtered on soda-lime glass. Our experimental results could lead to better understanding for improving further CIGS-based photovoltaic devices.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1123: Symposium P – Photovoltaic Materials and Manufacturing Issues , 2008 , 1123-P05-18
Copyright
Copyright © Materials Research Society 2009

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