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Effect of Mo Doping on Formation of Ti-Silicide Phases Studied by HRTEM

Published online by Cambridge University Press:  10 February 2011

M. A. Gribelyuk ,
S. B. Samavedam  and
J. A. Kittl
M. A. Gribelyuk
Affiliation:
[email protected]
S. B. Samavedam
Affiliation:
Massachusetts Institute of Technology, Cambridge, MA 02139
J. A. Kittl
Affiliation:
Silicon Technology Development, Texas Instruments Inc., Dallas, TX 75243
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Abstract

The phase sequence of the RTP induced reaction at T=650°C has been studied. We found that pre-amorphization of poly-Si substrates does not change the reaction path. i.e. Ti5Si4, and C-49 TiSi2 phases were formed_ with the latter growing upon further anneal. In the Mo doped poly-Si/Ti system the C-54 TiSi2 phase has formed along with Ti5Si4 and two Mo silicide phases, MoSi2 and Mo5Si3; no C-49 TiSi2 was observed. We show that the reaction in the Mo doped system follows the template mechanism with MoSi2 and Mo5Si3 based phase acting as template phases for accelerated growth of C-54 TiSi2.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 523: Symposium U – Electron Microscopy of Semiconducting Materials & ULSI Devices , 1998 , 91
Copyright
Copyright © Materials Research Society 1998

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