Hostname: page-component-78c5997874-mlc7c Total loading time: 0 Render date: 2024-11-05T08:52:03.036Z Has data issue: false hasContentIssue false

The Effect of Al in Plasma-Assisted MBE-Grown GaN

Published online by Cambridge University Press:  03 September 2012

Otto Zsebök
Affiliation:
Applied Semiconductor Physics Department of Microelectronics and Nanoscience Physics and Engineering PhysicsChalmers University of Technology and Göteborg UniversitySE-412 96 Göteborg, Sweden
Jan V. Thordson
Affiliation:
Applied Semiconductor Physics Department of Microelectronics and Nanoscience Physics and Engineering PhysicsChalmers University of Technology and Göteborg UniversitySE-412 96 Göteborg, Sweden
Qingxiang Zhao
Affiliation:
Applied Semiconductor Physics Department of Microelectronics and Nanoscience Physics and Engineering PhysicsChalmers University of Technology and Göteborg UniversitySE-412 96 Göteborg, Sweden
Ulf Södervall
Affiliation:
Applied Semiconductor Physics Department of Microelectronics and Nanoscience Physics and Engineering PhysicsChalmers University of Technology and Göteborg UniversitySE-412 96 Göteborg, Sweden
Lars Ilver
Affiliation:
Applied Semiconductor Physics Department of Microelectronics and Nanoscience Physics and Engineering PhysicsChalmers University of Technology and Göteborg UniversitySE-412 96 Göteborg, Sweden
Thorvald G. Andersson
Affiliation:
Applied Semiconductor Physics Department of Microelectronics and Nanoscience Physics and Engineering PhysicsChalmers University of Technology and Göteborg UniversitySE-412 96 Göteborg, Sweden
Get access

Abstract

We have grown GaN, with addition of a 0.10 to 0.33 % Al, on sapphire(0001) substrates by solid-source RF-plasma assisted MBE. The Al-concentration was determined by secondary ion-mass spectrometry and Auger-electron spectroscopy, while the layer quality was assessed by photoluminescence and high-resolution scanning electron microscopy. Microscopy revealed a meandering pattern and a surface roughness varying with Al-content. The smallest surface roughness was obtained at 0.10 % Al. Photoluminescence revealed two main peaks attributed to the neutral donor-bound exciton. Its energy increased slightly with Al-concentration, which established a correlation between the Al-concentration and the band gap.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Nakamura, S., J. Cryst. Growth, 170, 11 (1997).Google Scholar
2. Shah, P. and Mitin, V., J. App. Phys., 81, 5930 (1997).Google Scholar
3. Widmann, F., Daudin, B., Feuillet, G., Pelekanos, N., and Rouvière, J. L., Appl. Phys. Lett., 73, 2642 (1998).Google Scholar
4. Shu, C. K., Ou, J., Lin, H. C., Chen, W. K., and Lee, M. C., Appl Phys. Lett., 73, 641 (1998).Google Scholar
5. Steude, G., Christmann, T., Meyer, B. K., Goeldner, A., Hoffmann, A., Bertram, F., Christen, J., Amano, H., and Akasaki, I., MRS Internet J. Nitride Semicond. Res., 4S1, G3.26 (1999).Google Scholar
6. Andrianov, A. V., Lacklison, D. E., Orton, J. W., Sewsnip, D. J., Hooper, S. E., and Foxon, C. T., Semicond. Sci. Technol., 11, 366 (1996).Google Scholar
7. Tarsa, E. J., Heying, B., Wu, X. H., Fini, P., DenBaars, S. P., and Speck, J. S., J. Appl. Phys., 82, 5472 (1997).Google Scholar
8. Volm, D., Oettinger, K., Streibl, T., Kovalev, D., Ben-Chorin, M., Diener, J., and Meyer, B. K., Phys. Rev. B, 53, 16543 (1996).Google Scholar
9. Lagerstedt, O. and Monemar, B., J. Appl. Phys., 45, 2266 (1974).Google Scholar
10. Strauf, S., Michler, P., Gutowski, J., Selke, H., Birkle, U., Einfeldt, S., Hommel, D., J. Cryst. Growth, 189/190, 682 (1998).Google Scholar
11. Smith, M., Chen, G. D., Lin, J. Y., Jiang, H. X., Salvador, A., Sverdlov, B. N., Botchkarev, A., and Morkoç, H., Appl. Phys. Lett., 66, 3474 (1995).Google Scholar
12. Polyakov, A. Y., Govorkov, A. V., Smirnov, N. B., Mil'vidskii, M. G., Redwing, J. M., Shin, M., Skowronski, M. and Greve, D. W., Solid State Electr., 42, 637 (1998).Google Scholar
13. Jenny, J. R., Nostrand, J. E. Van, and Kaspi, R., Appl. Phys. Lett., 72, 85 (1998).Google Scholar
14. Bremser, M. D., Perry, W. G., Zheleva, T., Edwards, N. V., Nam, O. H., Parikh, N., Aspnes, D. E., and Davis, R. F., MRS Internet J. Nitride Semicond. Res., 1, 8 (1996).Google Scholar
15. Korakakis, D., Ng, H. M., Misra, M., Grieshaber, W., Moustakas, T. D., MRS Internet J. Nitride Semicond. Res., 1, 10 (1996).Google Scholar