Hostname: page-component-78c5997874-j824f Total loading time: 0 Render date: 2024-11-06T00:26:21.365Z Has data issue: false hasContentIssue false

Disorder Production at Metal-Silicon Interfaces by MeV/amu Ion Irradiation

Published online by Cambridge University Press:  25 February 2011

F. L. Headrick
Affiliation:
Department of Materials Science and Engineering, University of Pennsylvania, Philadelphia, PA 19104
L. E. Seiberling
Affiliation:
Department of Physics, University of Pennsylvania, Philadelphia, PA 19104
Get access

Abstract

We have shown that irradiation of Ag-Si and Au-Si interfaces by 14 MeV 016 ions can produce non-registered silicon at the metal-silicon interface. Evidence that this effect is due to electronic energy loss of the bombarding ion is presented. The possible relationship of this effect to MeV-ion enhanced adhesion is discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1985

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Griffith, J. E., Qui, Y., and Tombrello, T. A., Nucl. Instr. Meth. 198, 607 (1982).Google Scholar
2. Mendenhall, M. H., Ph.D. thesis, Caltech (1983).Google Scholar
3. Tombrello, T. A., Int. J. Mass. Spec. and Ion Phys., to be published (1984).Google Scholar
4. Jacobson, S., Jonsson, B., and Sundqvist, B., Thin Solid Films 107, 89 (1983).Google Scholar
5. Seiberling, L. E., Griffith, J. E., and Tombrello, T. A., Rad. Eff. 52, 201 (1980).Google Scholar
6. Boring, J. W., Johnson, R. E., Reimann, C. T., Garret, J. W., Brown, W. L., and Marcantonio, K. J., Nucl. Instr. Meth. 218, 707 (1983).Google Scholar
7. Headrick, R. L., and Seibering, L. E., Appl. Phys. Lett. 45, 388 (1984).Google Scholar
8. Feldman, L. C., Silverman, P. J., Williams, J. S., Jackman, T. E., and Stensgaard, I., Phys. Rev. Lett. 41, 1396 (1978).Google Scholar
9. Tombrello, T. A., Mater. Res. Soc. Symp. Proc. 27, 173 (1984).Google Scholar
10. Mitchell, I. V., Williams, J. S., Smith, P., and Elliman, R. G., Appl. Phys. Lett. 44, 193 (1984).Google Scholar
11. Feldman, L. C., Mayer, J. W., and Picraux, S. T., Materials Analysis by Ion Channeling, Academic Press, New York (1982).Google Scholar
12. Kinchin, G. H., and Pease, R. S., Rep. Prog. Phys. 18, 1 (1955).Google Scholar
13. Iwami, H., Tromp, R. M., Van Loenen, E. J., and Saris, F. W., Physica 116B, 328 (1983).Google Scholar
14. Behrooz, A. M., Shadovitz, D. M., Seiberling, L. E., Balamuth, D. P., Zurmuhle, R. W., and Headrick, R. L., to be published.Google Scholar
15. Ponpon, J. P., Grob, J. J., Grob, A., Stuck, R., and Siffert, P., Nucl. Instr. Meth. 149, 647 (1978).Google Scholar
16. Yuanxun Qiu, Griffith, J. E., Meng, Wen Jin, and Tombrello, T. A., Rad. Eff. 70, 231 (1983).Google Scholar
17. Tombrello, T. A., Mater. Res. Soc. Symp. Proc. 25, 173 (1984).Google Scholar