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Direct Patterning of Quartz Substrates by Laser Ablation Using VUV Anti-Stokes Raman Pulses

Published online by Cambridge University Press:  01 January 1992

K. Sugioka ,
S. Wada ,
H. Tashiro ,
K. Toyoda ,
T. Sakai ,
H. Takai ,
H. Moriwaki  and
A. Nakamura
K. Sugioka
Affiliation:
RIKEN, The Institute of Physicaland Chemical Research, Wako, Saitama 351–01, Japan
S. Wada
Affiliation:
RIKEN, The Institute of Physicaland Chemical Research, Wako, Saitama 351–01, Japan
H. Tashiro
Affiliation:
RIKEN, The Institute of Physicaland Chemical Research, Wako, Saitama 351–01, Japan
K. Toyoda
Affiliation:
RIKEN, The Institute of Physicaland Chemical Research, Wako, Saitama 351–01, Japan
T. Sakai
Affiliation:
Tokyo Denki University, 2–2, Kanda-Nishi-Cho, Chiyoda-Ku, Tokyo 101, Japan
H. Takai
Affiliation:
Tokyo Denki University, 2–2, Kanda-Nishi-Cho, Chiyoda-Ku, Tokyo 101, Japan
H. Moriwaki
Affiliation:
Science University of Tokyo, 1–3, Kagurazaka, Shinjuku-Ku, Tokyo 162, Japan
A. Nakamura
Affiliation:
Science University of Tokyo, 1–3, Kagurazaka, Shinjuku-Ku, Tokyo 162, Japan
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Abstract

High speed microfabrication of quartz substrates by laser ablation using vacuum ultraviolet (VUV) laser beams is described. The VUV light is generated by anti-Stokes stimulated Raman scattering of fourth harmonics of Q-switched Nd:YAG laser. The well-defined patterns with a cross-sectional profile of rectangular shape are formed by using a contact mask. The role of short wavelength components of the VUV laser beams in the process is discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 285: Symposium I – Laser Ablation in Materials Processing–Fundamentals and Applications , 1992 , 225
Copyright
Copyright © Materials Research Society 1993

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References

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