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Development of Parallel Dip Pen Nanolithography Probe Arrays for High Throughput Nanolithography

Published online by Cambridge University Press:  11 February 2011

David A. Bullen
Affiliation:
Micro and Nanotechnology Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL, 61801
Xuefeng Wang
Affiliation:
Micro and Nanotechnology Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL, 61801
Jun Zou
Affiliation:
Micro and Nanotechnology Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL, 61801
Sung-Wook Chung
Affiliation:
Department of Chemistry, Northwestern University, Chicago, IL
Chang Liu
Affiliation:
Micro and Nanotechnology Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL, 61801
Chad A. Mirkin
Affiliation:
Department of Chemistry, Northwestern University, Chicago, IL
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Abstract

Dip Pen Nanolithography (DPN) is a lithographic technique that allows direct deposition of chemicals, metals, biological macromolecules, and other molecular “inks” with nanometer dimensions and precision. This paper addresses recent developments in the design and demonstration of high-density multiprobe DPN arrays. High-density arrays increase the process throughput over individual atomic force microscope (AFM) probes and are easier to use than arrays of undiced commercial probes. We have demonstrated passive arrays made of silicon (8 probes, 310 μm tip-to-tip spacing) and silicon nitride (32 probes, 100 μm tip-to-tip spacing). We have also demonstrated silicon nitride “active” arrays (10 probes, 100 μm tip-to-tip spacing) that have embedded thermal actuators for individual probe control. An optimization model for these devices, based on a generalized multilayer thermal actuator, is also described.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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References

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