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Deuterium Incorporation into Glow-Discharge Deposited Deuterated-Hydrogenated Amorphous Silicon
Published online by Cambridge University Press: 15 February 2011
Abstract
We investigate deuterium incorporation into deuterated-hydrogenated amorphous silicon grown by the saddle-field glow-discharge of deuterium and silane. The presence of HD and SiH3D in the discharge suggests strong gas phase mixing. The dominant process of deuterium incorporation into the growing film appears to be the direct reaction between deuterium and the growth surface.
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- Copyright © Materials Research Society 1995
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