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Deposition of Dielectric Optical Coatings: A Microstructural Study of the Deposited Layers and Interfaces

Published online by Cambridge University Press:  21 February 2011

J. M. McCarthy ,
L. E. Thomas ,
W. T. Pawlewicz ,
W. S. Frydrych  and
G. J. Exarhos
J. M. McCarthy
Affiliation:
Pacific Northwest Laboratory, operated for the Department of Energy by Battelle Memorial Institute, P.O.Box 999, Richland, WA 99352
L. E. Thomas
Affiliation:
Pacific Northwest Laboratory, operated for the Department of Energy by Battelle Memorial Institute, P.O.Box 999, Richland, WA 99352
W. T. Pawlewicz
Affiliation:
Pacific Northwest Laboratory, operated for the Department of Energy by Battelle Memorial Institute, P.O.Box 999, Richland, WA 99352
W. S. Frydrych
Affiliation:
Pacific Northwest Laboratory, operated for the Department of Energy by Battelle Memorial Institute, P.O.Box 999, Richland, WA 99352
G. J. Exarhos
Affiliation:
Pacific Northwest Laboratory, operated for the Department of Energy by Battelle Memorial Institute, P.O.Box 999, Richland, WA 99352
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Abstract

Thin dielectric films for optical applications are deposited on substrates using a variety of techniques including reactive sputtering, solgel reaction, and ion assisted plasma deposition. This transmission electron microscopy study characterizes optical coatings produced by the above deposition techniques and shows how changes in deposition conditions change microstructure and as a result the optical properties.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 152: Symposium H – Optical Materials: Processing and Science , 1989 , 201
Copyright
Copyright © Materials Research Society 1989

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References

REFERENCES

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