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Deposition of Diamond-Like Carbon Films using Plasma Based Ion Implantation with Bipolar Pulses

Published online by Cambridge University Press:  17 March 2011

S. Miyagawa  and
Y. Miyagawa
S. Miyagawa
Affiliation:
Particle Beam Science Laboratory, National Industrial Research Institute of Nagoya 1-1 Hirate-cho, Kita-ku, Nagoya 462-8510, Japan
Y. Miyagawa
Affiliation:
Particle Beam Science Laboratory, National Industrial Research Institute of Nagoya 1-1 Hirate-cho, Kita-ku, Nagoya 462-8510, Japan
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Abstract

Plasma based ion implantation (PBII) with bipolar high voltage pulses has been proposed to improve a dose uniformity in an ion implantation on a three-dimensional target. A pulsed glow discharge plasma is produced around the target by a positive high-voltage pulse, and then ions are implanted into the target from all sides by the subsequent negative high-voltage pulse. A time resolved plasma density and the spatial profiles of the pulsed glow discharge plasma are measured by a Langmuir probe in a boxcar mode, and diamond like carbon (DLC) films are deposited under optimal conditions of the pulsed plasma. It is shown that the PBII with bipolar pulses is a useful method in depositing DLC films on the three-dimensional target. A carbon ion implantation procedure results in the enhanced adherence of DLC coating to the target, and the enhanced adhesion is due to a graded carbon interface produced by carbon implantation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 647: Symposium O – Ion Beam Synthesis & Processing of Advanced Materials , 2000 , O11.7
Copyright
Copyright © Materials Research Society 2001

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