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Deposition of aluminum Oxynitride Films by Magnetron Sputtering: Effect of Bombardment and Substrate Heating on Structural and Mechanical Properties

Published online by Cambridge University Press:  21 February 2011

Russell V. Smilgys ,
Eric Takamura ,
Irwin L. Singer ,
Steven W. Robey  and
Douglas A. Kirkpatrick
Russell V. Smilgys
Affiliation:
Science applications international Corp., 1710 Goodridge Dr., McLean, VA 22102
Eric Takamura
Affiliation:
GeoCenters, 10903 indian Head Highway, Fort Washington, MD 20744
Irwin L. Singer
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375
Steven W. Robey
Affiliation:
National institute of Standards and Technology, Gaithersburg, MD 20899
Douglas A. Kirkpatrick
Affiliation:
Science applications international Corp., 1710 Goodridge Dr., McLean, VA 22102
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Abstract

Aluminum oxynitride films, 1 μm thick, are deposited onto glass substrates by planar magnetron sputtering from an alumina target in a mixture of nitrogen and argon. one set of films is deposited onto glass substrates that are heat sunk to a holder, whose temperature is held below 100°C. a second set of films is deposited onto glass substrates that are mechanically clamped to a holder, whose temperature is allowed to rise up to 250°C. Characterization by continuous indentation testing, secondary electron microscopy, and x-ray diffraction reveals significant differences in mechanical properties and surface structure between the two sets of films. Films deposited with holder cooling have a smooth surface and no evidence of crystallinity; films deposited without holder cooling have etch pits on their surface that vary with position across the substrate. the later films show crystallinity and have twice the hardness and a 60% greater elastic modulus.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 388: Symposium Q – Film Synthesis and Growth Using Energetic Beams , 1995 , 311
Copyright
Copyright © Materials Research Society 1995

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References

1 -E. Sundgren, J. and Hentzell, H.T. G., J. Vac. Sci. Technol. A 4, 2259 (1986).Google Scholar
2 Lawn, B., Fracture of Brittle Solids (Cambridge University Press, Cambridge 1993) Chap 8.Google Scholar
3 Oliver, W. C. and Pharr, G. M., J. Mat. Res. 7, 1564 (1992).Google Scholar
4 Weiler, W. W., Amer. Soc. for Testing and Eval. 18,229 (1990).Google Scholar
5 Kester, D. J. and Messier, R., J. Mater. Res. 8, 1938 (1993).Google Scholar
6 Tominaga, K., Iwamura, S., Shintani, Y., and Tada, O., Jpn. J. appl. Phys. 22, 418 (1983).Google Scholar
7 Auciello, O., and Kelly, R., eds. Ion Beam Bombardment Modification of Surfaces (Elevier, New York, 1984).Google Scholar
8 Banks, B. A., NASA Tech. Memo. #81721 (NASA, 1981).Google Scholar
9 Franze, W., Tetreault, T., Kosik, W., Croft, W., and Hirvonen, J.K., Mat. Res. Soc. Proc. 279, 825 (1993).Google Scholar
10 Dongfeng, D. and Kato, K., Thin Solid Films 245, 104 (1994).Google Scholar