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Deposition of Al65Cu23Fe12 and Composite Quasicrystalline Pvd Thin Film Coatings

Published online by Cambridge University Press:  17 March 2011

Daniel J. Sordelet ,
Matthew F. Besser  and
Frank M. Kustus
Daniel J. Sordelet
Affiliation:
Ames Laboratory, Ames, IA 50011
Matthew F. Besser
Affiliation:
Department of Materials Science and Engineering, Iowa State University, Ames, IA 50011
Frank M. Kustus
Affiliation:
Engineered Coatings Inc, Parker, CO 80134
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Abstract

Thin film coatings of Al-based quasicrystals were deposited by magnetron sputtering. Sputtering targets of Al65Cu23Fe12 and Al65Cu23Fe12+5v/o Fe-Al were prepared with plasma arc spraying by forming thick (∼5mm) coatings onto Cu substrates. By incorporating a controlled fraction of porosity and micro-cracks within the plasma sprayed target, cracking or delamination of the target during magnetron sputtering could be avoided. Compositions of the as-deposited PVD films were close to the sputtering target composition when the bias voltage was kept around –40V; higher bias voltages (e.g., -100 to -200V) lead to coatings that were deficient in Al. As-deposited coatings prepared with the lower bias voltage could be subsequently annealed at 700°C for two hours to yield a nearly single-phase icosahedral structure. After annealing, composite coatings indicate the presence of an Fe-Al phase along with the icosahedral phase.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 643: Symposium K – Quasicrystals-Preparation, Properties, and Applications , 2000 , K9.15
Copyright
Copyright © Materials Research Society 2001

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References

1. Urban, K., Feuerbacher, M., and Wollgarten, M., MRS Bulletin 22, p. 65 (1997).Google Scholar
2. Feuerbacher, M., Baufeld, B., Rosenfeld, R., Bortsch, M., Hanke, G., Beyss, M., Wollgarten, M., Messerschmidt, U., and Urban, K., Phil. Mag. Lett. 71, p. 91 (1995).Google Scholar
3. Rosenfeld, R., Feuerbacher, M., Baufeld, B., Bartsch, M., Wollgarten, M., Hanke, G., Beyss, M., Messerschmidt, U., and Urban, K., Phil. Mag. Lett. 72, p. 375 (1995).Google Scholar
4. Dubois, J.M., Plaindoux, P., Belin-Ferré, E., Tamura, N., and Sordelet, D. J. in Quasicrystals, Proc. of 6th Int. Congr. On Quasicrystals, Tokyo, 1997, Edited by Fujiwara, T. (World Scientific, Singapore 1998), p. 733.Google Scholar
5. Feuerbacher, M., Metzmacher, C., Wollgarten, M., Urban, K., Baufeld, B., Bartsch, M., and Messerschmidt, U., Mater. Sci. Eng. A 233, p. 103 (1997).Google Scholar
6. Kreider, K., Biancaniello, F., and Kaufman, M., Scritpa Metall. 21, p. 657 (1987).Google Scholar
7. Chen, C.L. and Lu, M., Phys. Rev. B 45, p. 12793 (1992).Google Scholar
8. Yoshioka, A., Edagawa, K., Kimura, K., and Takeuchi, S., Jpn. J. Appl. Phys. 34, p. 1606 (1995).Google Scholar
9. Sordelet, D.J., Besser, M.F. and Anderson, I.E., J. Thermal Spray Tech. 5, p. 161 (1996).Google Scholar
10. Sordelet, D.J., Besser, M.F. and Logsdon, J.L., Mater. Sci. and Eng. A 255 p. 54 (1998).Google Scholar
11. Sordelet, D.J., Bloomer, T.E., Kramer, M.J. and Unal, O., J. Mater. Sci. Lett.,15, p. 935 (1996).Google Scholar
12. Daniels, M.J., Maciejewski, J., Zabinski, J.S., Rek, Z.U., Yalisove, S.M., and Bilello, J.C., MRS Fall 2000 meeting, Symposium K, Quasicrystals.Google Scholar