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Deposition and Characterization of Carbon Nitride Films by Laser Processed Methods

Published online by Cambridge University Press:  15 February 2011

Ashok Kumar ,
R. Alexandrescu  and
Michael A. George
Ashok Kumar
Affiliation:
Advanced Thin Film Laboratory, Department of Electrical Engineering, EEB 60, University of South Alabama, Mobile, AL 36688
R. Alexandrescu
Affiliation:
National Institute for Lasers, Plasma and Radiation Physics, P. O. Box MG-36, R-76900, Bucharest, Romania
Michael A. George
Affiliation:
Laboratory for Materials and Surface Science, University of Alabama in Huntsville, Huntsville, AL 35899
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Abstract

Laser assisted methods such as laser physical vapor deposition (LPVD) and laser induced chemical vapor deposition (LCVD) have been utilized to grow carbon nitride (CNx) films on various substrates. It has been shown that the both techniques produce good quality thin films of CNx. In LPVD, a laser beam (λ= 248 nm) has been used to ablate the pyrolytic graphite target in nitrogen atmosphere, where as CO2 laser was to irradiate carbon-nitrogen containing mixtures such as C2H2/N2O/NH3 in LCVD method. A comparative analysis will be presented in terms of structural properties of CNx films prepared by both techniques.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 526: Symposium Y – Advances in Laser Ablation of Materials , 1998 , 367
Copyright
Copyright © Materials Research Society 1998

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