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Dependence of Hardness and Stiffness on Density of Ta2O5 and TiO2 Layers

Published online by Cambridge University Press:  15 February 2011

S. P. Baker ,
C. R. Ottermann ,
M. Laube ,
F. Rauch  and
K. Bange
S. P. Baker
Affiliation:
Max-Planck-Institut für Metallforschung, Seestr. 92, D-70174 Stuttgart, Germany
C. R. Ottermann
Affiliation:
Schott Glaswerke R&D, PO Box 24 80, D-55014 Mainz, Germany
M. Laube
Affiliation:
Universität Frankfurt, Institut für Kernphysik, D-60486, Frankfurt, Germany
F. Rauch
Affiliation:
Universität Frankfurt, Institut für Kernphysik, D-60486, Frankfurt, Germany
K. Bange
Affiliation:
Schott Glaswerke R&D, PO Box 24 80, D-55014 Mainz, Germany
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Abstract

Highly refractive amorphous TiO2 and Ta2O5 films with thicknesses between 270 and 514 nm were deposited on fused silica glass substrates by reactive evaporation and reactive ion plating. Density, hardness, and stiffness were investigated as a function of deposition process. The films were examined using Rutherford backscattering spectroscopy and were found to have densities between 72 and 100% of those of the corresponding bulk oxides. Nanoindentation studies indicated a strong correlation between density and both hardness and elastic stiffness of the oxide film materials. Hardness and modulus both varied by more than 40% over this density range.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 436: Symposium CC – Thin Films Stresses and Mechanical Properties VI , 1996 , 71
Copyright
Copyright © Materials Research Society 1997

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