Article contents
Defect Structures and Planar Faults in Plasma Spray Deposited MoSi2
Published online by Cambridge University Press: 01 January 1992
Abstract
Plasma-sprayed microstructures of MoSi2 have been studied by electron microscopy. The as-deposited microstructures are metastable and inhomogenous. Two new dissociations of [001] and 1/2[331] dislocations have been observed for the first time. The 1/2[331] is dissociated on the (lTO) plane bounding a superlattice intrinsic stacking fault (SISF). The reaction is given as: 1/2[331] = 1/4[331] + SISF + [331]. The [001] is also dissociated on (110) plane into two symmetrical components, with the reaction being given as [001] = 1/2[001] + 1/2[001].
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 1995
References
REFERENCES
- 2
- Cited by