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Defect Structure of Diamond Film at the Interface with Amorphous Carbon

Published online by Cambridge University Press:  25 February 2011

Li Chang
Li Chang*
Affiliation:
Materials Research Laboratories, Industrial Technology Research Institute, Chutung, Hsinchu 31015, Taiwan, R.O.C.
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Abstract

Diamond films prepared by microwave plasma chemical vapor deposition, using a gas mixture of methane and hydrogen with ethanol, were formed on silicon substrates. Highresolution transmission electron microscopy was employed to characterize the microstructure at interface regions. It was found that the diamond crystals were grown on an amorphous carbon layer. Twins and stacking faults were observed at the regions interfaced with the amorphous carbon layer, suggesting that the defects may already exist in the nucleation stage and at the very first stage of growth. Also, some diamond nuclei embedded in the amorphous layer were observed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 270: Symposium M – Novel Forms of Carbon , 1992 , 353
Copyright
Copyright © Materials Research Society 1992

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References

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