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Cubic Boron Nitride Prepared by an ECR Plasma

Published online by Cambridge University Press:  16 February 2011

Y. Osaka ,
M. Okamoto  and
Y. Utsumi
Y. Osaka
Affiliation:
Department of Electrical Engineering, Hiroshima University, Higashihiroshima 724, Japan
M. Okamoto
Affiliation:
Department of Electrical Engineering, Hiroshima University, Higashihiroshima 724, Japan
Y. Utsumi
Affiliation:
Department of Electrical Engineering, Hiroshima University, Higashihiroshima 724, Japan
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Abstract

A number of deposition techniques for cubic BN films from the vapor phase at low pressures have been proposed. We show that the essential factor for creating cubic BN films is a negative self-bias applied to the substrate. The optical and mechanical properties of the deposited films are characterized by reflectance and stress measurements, respectively.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 223: Symposium E – Low Energy Ion Beam and Plasma Modification of Materials , 1991 , 81
Copyright
Copyright © Materials Research Society 1991

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References

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