Hostname: page-component-78c5997874-j824f Total loading time: 0 Render date: 2024-11-20T06:05:19.023Z Has data issue: false hasContentIssue false
  • English
  • Français

Crystallographic Analysis of Cvd Films by Using X-Ray Polychromatic Radiation

Published online by Cambridge University Press:  10 February 2011

B. Lavelle ,
L. Brissonneau ,
E. Baggot  and
C. Vahlas
B. Lavelle
Affiliation:
Centre d'Elaboration de Matériaux et d'Etudes Structurales, CNRS, 29, rue J. Marvig, 31055 Toulouse cedex 4, France, [email protected]
L. Brissonneau
Affiliation:
Laboratoire Matériaux et Interfaces, INPT-CNRS, ENS Chimie de Toulouse, 118, route de Narbonne, 31077 Toulouse cedex 4, France
E. Baggot
Affiliation:
Laboratoire Matériaux et Interfaces, INPT-CNRS, ENS Chimie de Toulouse, 118, route de Narbonne, 31077 Toulouse cedex 4, France
C. Vahlas
Affiliation:
Laboratoire Matériaux et Interfaces, INPT-CNRS, ENS Chimie de Toulouse, 118, route de Narbonne, 31077 Toulouse cedex 4, France, [email protected]
Get access

Abstract

The Energy Dispersive X-ray Diffiractometry (EDXD) technique was tested for in-situ crystallographic characterization of nickel films processed by chemical vapor deposition (CVD). The diffracted beam at low Bragg angle was analyzed in energy by a solid state detector. A nickel reference sample was used to face the problems of EDXD background signal and uncertainty of sample location. The relative accuracy on lattice parameters measurements is 1.5.10−3, to be compared to 0.5.10−3 for classical (monochromatic) X-Ray diffraction. Texture measurements yields results in agreement with those obtained from recent texture goniometer. Finally, an estimation of the thickness was obtained from the intensity of nickel fluorescence peak. In view of the obtained results, EDXD appears to be a promising technique for in-situ studies. Although less powerful compared to the synchrotron facility, it is more flexible and can be applied at lower cost.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 524: Symposium V – Application of Synchrotron Radiation Techniques…IV , 1998 , 121
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Bechtoldt, C. J., Placious, R. C., Boettinger, W. J. and Kuriyama, M., Advances in X-Ray Analysis 25 (1982) 329–337.Google Scholar
[2] Ruppersberg, H. and Detemple, I., Materials Science and Engineering A161 (1993) 41–44.Google Scholar
[3] Chason, E. and Chason, M., Journal of Vacuum Science and Technology A 12 (1994) 1565–1568.Google Scholar
[4] Lavelle, B. and Jaud, J., Transmission X-ray stress determination using a polychromatic radiation on aluminum alloys and stainless steel, presented at ICRS5, LinkÖping 1997.Google Scholar
[5] Brissonneau, L., Reynes, A. and Vahlas, C., Morphology and carbon content of nickel films deposited from nickelocene, presented at Chemical Vapor deposition XIV and EUROCVD-11, Paris,97–25, 1997.Google Scholar
[6] Convert, F. and Miege, B., Journal of Applied Crystallography 25 (1992) 384–390.Google Scholar
[7] Brissonneau, L., Vahlas, C. and Reynes, , Processing of pure nickel MOCVD films, presented at Symposium I, MRS Spring Meeting, San-Francisco 1998.Google Scholar
[8] Eberhart, J.-P., in Analyse structurale et chimique des matériaux, 2nd (Dunod, Paris, 1997), p.319–340.Google Scholar