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Crystalline Orientation Control in Bi-Sr-Ca-Cu-O Thin Films

Published online by Cambridge University Press:  16 February 2011

Yoshiki Ishizuka ,
Yoshiaki Terashima  and
Tadao Miura
Yoshiki Ishizuka
Affiliation:
Toshiba Research and Development Center, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210, Japan
Yoshiaki Terashima
Affiliation:
Toshiba Research and Development Center, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210, Japan
Tadao Miura
Affiliation:
Toshiba Research and Development Center, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210, Japan
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Abstract

Bi-Sr-Ca-Cu-0 thin films were prepared on (110)SrTiO3 by coevaporation with rf oxygen plasma. The non-(00n) crystalline orientations were formed in the Bi2 Sr2Ca2Cu3Oy1 Bi2Sr2 CaCu2Oy2 and Bi2Sr2CuOy3 phases. Furthermore, it was confirmed that the chemical composition and the oxygen plasma condition influenced the crystalline orientation. On the basis of these results, a new idea for the film growth mechanism is proposed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 223: Symposium E – Low Energy Ion Beam and Plasma Modification of Materials , 1991 , 147
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

1. Asano, H., Asahi, M., Katoh, Y. and Michikami, O., Jpn.J.Appl.Phys. 27, L1487 (1988)..Google Scholar
2. Nakayama, Y., Ochimizu, H., Maeda, A., Kawazu, A., Uchinokura, K. and Tanaka, S., Jpn.J.Appl.Phys. 28, L1217 (1989).Google Scholar
3. Mizuno, K., Higashino, K., Setsune, K. and Wasa, K., Appl.Phys.Lett. 56, 1469 (1990).Google Scholar
4. Mizuno, K., Higashino, K., Setsune, K. and Wasa, K., Appl.Phys.Lett. 58, 640 1991).Google Scholar
5. Ishizuka, Y., Terashima, Y. and Miura, T., to be published in Jpn.J.Appl.Phys.Google Scholar
6. Kuroda, K., Kojima, K., Wada, O., Tanioku, M., Yokoyama, K. and Iamanaka, K., Jpn.J. Appl.Phys. 29, L1816 (1990).Google Scholar
7. Kuroda, K., Wada, O., Kojima, K., Tanimura, J., Kataoka, M., Takami, T., Yokoyama, K., Ogama, T. and Hamanaka, K., Jpn.J.Appl.Phys. 30, L475 (1991).Google Scholar
8. Kuroda, K., Wada, O., Tanimura, J., Kojima, K., Takami, T., Kataoka, M., Ogama, T. and Hamanaka, K., Jpn.J.Appl.Phys. 30, L582 (1991).Google Scholar
9. Ishizuka, Y., Terashima, Y. and Miura, T., Jpn.J.Appl.Phys. 29, L2045 (1990).Google Scholar
10. Terashima, T., Bando, Y., Iijima, K. Yamamoto, K. and Hirata, K., Appl.Phys.Lett. 53, 2232 (1988).Google Scholar