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Crystal Structure and Magnetic Properties of Co-Based Alloy Thin Film Prepared on Cr Underlayer With Good Crystallite Orientation

Published online by Cambridge University Press:  15 February 2011

T. Kawanabe
Affiliation:
Fujisawa plant, IBM Japan, 1, Kirihara, Fujisawa, Kanagawa 252, Japan
J. G. Park
Affiliation:
Tokyo Institute of Technology, Dept. of Physical Electronics, 2-12-1, Oh-okayama, Meguro-ku, Tokyo 152, Japan.
M. Naoe
Affiliation:
Tokyo Institute of Technology, Dept. of Physical Electronics, 2-12-1, Oh-okayama, Meguro-ku, Tokyo 152, Japan.
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Abstract

Co85Cr15-xTax(x:0, 2at%)/Cr films with microscopically flat surface were investigated for high density recording media. These films were deposited on silicon wafer and glass substrates at the substrate temperature Ts of 350 °C at argon pressure as low as sub-mTorr by using Facing Targets Sputtering (FTS) apparatus. The elevating of Ts promoted the Cr(200) orientation in film plane, leading to the in-plane c-axis orientation of Co crystallites. Addition of some elements such as Si, Ge and Ta in Cr thin film was found to stabilize Cr(110) crystal orientation even at Ts of 300 °C.

Type
Research Article
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

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