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Critical Review of 1-Particle Models in Electromigration Resistance Change Modeling

Published online by Cambridge University Press:  22 February 2011

J. Niehof ,
H.C. de Graaff ,
A.J. Mouthaan  and
J.F. Verwey
J. Niehof
Affiliation:
MESA Research Institute, University of Twente, Dept. of Electrical Engineering, group ICE, P.O. Box 217, 7500 AE Enschede, The Netherlands
H.C. de Graaff
Affiliation:
MESA Research Institute, University of Twente, Dept. of Electrical Engineering, group ICE, P.O. Box 217, 7500 AE Enschede, The Netherlands
A.J. Mouthaan
Affiliation:
MESA Research Institute, University of Twente, Dept. of Electrical Engineering, group ICE, P.O. Box 217, 7500 AE Enschede, The Netherlands
J.F. Verwey
Affiliation:
MESA Research Institute, University of Twente, Dept. of Electrical Engineering, group ICE, P.O. Box 217, 7500 AE Enschede, The Netherlands
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Abstract

An investigation is made into the capability of one-particle models in modeling electromigration-induced resistance changes. Analytically obtained solutions to the model equations are used to gain more insight into the vacancy distribution as a result of the applied boundary conditions. These solutions are then used to determine the resistance change modeling capabilities of three types of one-particle models.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 338: Symposium – Materials Reliability in Microelectronics IV , 1994 , 465
Copyright
Copyright © Materials Research Society 1994

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References

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