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Creating Nanostructures with Controllable Sidewall Profiles for Mechanical Sensor Applications

Published online by Cambridge University Press:  01 February 2011

Yi Zhao
Affiliation:
[email protected], Boston University, Department of Manufacturing Engineering, United States
Xin Zhang
Affiliation:
[email protected], Boston University, Department of Manufacturing Engineering, 15 Saint Mary' St, Boston, MA, 02215, United States
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Abstract

This paper presents a novel approach to create silicon nanostructures with controlled sidewall profiles. The nanostructures are fabricated by alternating the reactive ion etching process and the exposure process to the atmosphere with moisture. The air exposure is believed attributed to the sidewall passivation by facilitating the fast formation of a thin SiO2/SiOxFy layer. Using this approach, three types of representative nanostructures are demonstrated, namely: nanopillars with vertical sidewall, nanopillars with narrowed necks, and suspending nanocantilevers. Without requiring expensive facilities and extensive expertise, this work is expected to provide an alternative for developing nanostructures with a variety of geometric profiles for mechanical sensing applications.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

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