Hostname: page-component-586b7cd67f-l7hp2 Total loading time: 0 Render date: 2024-11-29T10:53:18.890Z Has data issue: false hasContentIssue false

Correlations Among Degradations in Lead Zirconate Titanate thin Film Capacitors

Published online by Cambridge University Press:  21 February 2011

In K. Yoo
Affiliation:
Virginia Polytechnic Institute and State University, Department of Materials Science and Engineering, Blacksburg, VA 24061
Seshu B. Desu
Affiliation:
Virginia Polytechnic Institute and State University, Department of Materials Science and Engineering, Blacksburg, VA 24061
Jimmy Xing
Affiliation:
Virginia Polytechnic Institute and State University, Department of Materials Science and Engineering, Blacksburg, VA 24061
Get access

Abstract

Many attempts have been made to reduce degradation properties of Lead Zirconate Titanate (PZT) thin film capacitors. Although each degradation property has been studied extensively for the sake of material improvement, it is desired that they be understood in a unified manner in order to reduce degradation properties simultaneously. This can be achieved if a common source(s) of degradations is identified and controlled. In the past it was noticed that oxygen vacancies play a key role in fatigue, leakage current, and electrical degradation/breakdown of PZT films. It is now known that space charges (oxygen vacancies, mainly) affect ageing, too. Therefore, a quantitative ageing mechanism is proposed based on oxygen vacancy migration under internal field generated by either remanent polarization or spontaneous polarization. Fatigue, leakage current, electrical degradation, and polarization reversal mechanisms are correlated with the ageing mechanism in order to establish guidelines for simultaneous degradation control of PZT thin film capacitors. In addition, the current pitfalls in the ferroelectric test circuit is discussed, which may cause false retention, imprint, and ageing.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Yoo, I.K. and Desu, S.B., Phys. Stat. Sol. (a) 133, 565, (1992).Google Scholar
2. Duiker, H.M. et al. , J. Appl. Phys. 68(11), 5783 (1990)Google Scholar
3. Kudzin, A. Yu., Panchenko, T.V., and Yudin, S.P., Fiz. Tverd. Tela 16, 1589, (1975).Google Scholar
4. Lohkamper, R., Neuman, H., and Arlt, G., J. Appl. Phys. 68(8), 4220 (1990)CrossRefGoogle Scholar
5. Okazaki, K. et al. , Ferroelectrics 7, 153, (1984).Google Scholar
6. Alemany, C. et al. , J. Mater. Sci. 19, 2555, (1984).Google Scholar
7. Sarma, B.S. et al. , Ferroelectrics 5, 69, (1973).Google Scholar
8. Abt, N., 3rd ISIF Proc., 404 (1991)Google Scholar
9. Desu, S.B. and Yoo, I.K., 4th ISIF Proc., To be published, 1992 Google Scholar
10. Baiatu, T., Waser, R., and Hirdtl, K., F. Am. Ceram. Soc. 73(6), 1663 (1990)Google Scholar
11. Yoo, I.K. and Desu, S.B., 8th ISAF Proc., To be published, 1992 Google Scholar
12. Zharov, S. and Rudyak, V., Fizika (2), 9 (1989)Google Scholar
13. Yoo, I.K. and Desu, S.B., Phil. Mag., Submitted, 1993 Google Scholar
14. Miller, S. et al. , J. Appl. Phys. 68(12), 6463 (1990)Google Scholar
15. Rudyak, V., Izvestiya Akademii Nauk SSSr. Seriya Fizichieskaya 45(9), 1586 (1981)Google Scholar