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Control of Etching of LiNbO3, by Implant Damage Profile Tailoring

Published online by Cambridge University Press:  26 February 2011

P. J. Brannon ,
C. I. H. Ashby  and
G. W. Arnold
P. J. Brannon
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185–5800
C. I. H. Ashby
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185–5800
G. W. Arnold
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185–5800
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Abstract

Damage-profile tailoring using multi-energy ion implants can produce smooth side walls and deeper etched features with ion-bombardment-enhanced wet etching of LiNb03 than is possible with a single-energy implant. High ion fluences can produce buried microcracks which may contribute to propagation losses commonly observed in ion-implanted waveguides.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 101: Symposium B – Laser and Particle-Beam Chemical Processing for Microelectronics , 1987 , 469
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

1 Kawabe, M., Hirata, S., Masuda, K., and Namba, S., J. Vac. Sci. Technol. 15, 1098 (1978).Google Scholar
2 Kawabe, M., Hirata, S., and Namba, S., IEEE Trans. Circuits and Sys. CAS–26. 1109 (1979).Google Scholar
3 Gotz, G. and Karge, H., Nuci. Instrum. Methods 209/210. 1079 (1983).Google Scholar
4 Ziegler, J.F., Biersack, J. P., and Littmark, U., The Stopping and Range of Ions in Solids. Vol. 1, edited by Ziegler, J. F. (Pergamon Press, New York, 1985).Google Scholar
5 Naden, J. M. and Weiss, B. L., J. of Lightwave Tech. LT–3. 855 (1985).Google Scholar