No CrossRef data available.
Article contents
Conductance Measurements of Thermally Annealed, Si-Implanted Quartz
Published online by Cambridge University Press: 21 February 2011
Abstract
Preliminary conductance measurements of Si implanted, α-Quartz which had been annealed in ar to 1000• C have been made using a bridge method. the quartz was implanted to a dose expected to yield Si precipitates inside the quartz upon annealing. the measured conductivity, based on a geometry deduced from TRIM calculations and several trans-conductance measurements, is ~ 2 х 10-4(Ω m)-1. This is consistent with large islands of Si in series with an insulating matrix.
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 1995
References
1
Ramabadran, U., Howard, Jackson, Farlow, G. C., Nucl. INstru. and Methods
B59/60, (1991) 637.Google Scholar