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Comparison of CW and Pulsed UV Laser Etching of LiNbO3

Published online by Cambridge University Press:  25 February 2011

K.W. Beeson  and
N.S. Clements
K.W. Beeson
Affiliation:
Allied-Signal, Inc., P.O. Box 1021R, Morristown, NJ 07960
N.S. Clements
Affiliation:
Allied-Signal, Inc., P.O. Box 1021R, Morristown, NJ 07960
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Abstract

The results of CW frequency-doubled argon-ion laser etching and pulsed excimer laser etching of lithium niobate (LiNbO3) are compared. Argon-ion laser etching occurs in the presence of Cl2 at laser intensities of 1.1 MW/cm2 or higher. The 257 nm laser beam with up to 25 mW power is focused to a 1.5 μm diameter spot and scanned at speeds of 10 μm/s or less. Excimer laser etching is done at 248 nm (KrF) with the laser beam focused onto the sample with cylindrical optics. Trenches <20 μm wide and several millimeters long are produced by ablating the target and without scanning the beam. Excimer laser etching of lithium niobate has been attempted in the presence of C12, O2, N2, H2 or air. Excellent results are obtained with air as the etching medium.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 129: Symposium B – Laser and Particle-Beam Modification of Chemical Processes on Surfaces , 1988 , 321
Copyright
Copyright © Materials Research Society 1989

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References

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