No CrossRef data available.
Article contents
CMP related/CMP revealed short- and long-range integration interactions in copper dual damascene technology
Published online by Cambridge University Press: 18 March 2011
Extract
More than 4 years have passed since IBM made the official announcement approving copper dual damascene (Cu2D) technology, which drew the rest of the semiconductor world into the Cu2D race. And the technology appeared to be a hard nut to crack. Nowadays, after more than three years of extensive R&D work, the EOL yields are still low, and a lot of process integration work has to be done to make it mass production ready.
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 2001