Hostname: page-component-cd9895bd7-mkpzs Total loading time: 0 Render date: 2024-12-27T02:32:50.306Z Has data issue: false hasContentIssue false
  • English
  • Français

Cluster Ion Beam Processing: Review of Current and Prospective Applications

Published online by Cambridge University Press:  11 July 2011

Isao Yamada  and
Joseph Khoury
Isao Yamada
Affiliation:
Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, 671-2280 Japan.
Joseph Khoury
Affiliation:
Exogenesis Corporation, 20 Fortune Drive, Billerica, Massachusetts 01821 USA
Get access

Abstract

Cluster ion beam processes which employ ions comprised of a few hundred to several thousand atoms are being developed into a new field of ion beam technology. The processes are characterized by low energy surface interaction effects, lateral sputtering phenomena and high-rate chemical reaction effects. This paper reviews the current status of studies of the fundamental cluster ion beam characteristics as they apply to nanoscale processing and present industrial applications. As new prospective applications, techniques are now being developed to employ cluster ions in surface analysis tools such as XPS and SIMS and to modify surfaces of bio-materials. Results related to these new projects will also be reviewed.

Keywords

biomaterialnanostructureion-solid interactions
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1354: Symposium II – Ion Beams—New Applications from Mesoscale to Nanoscale , 2011 , mrss11-1354-ii03-01
Copyright
Copyright © Materials Research Society 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Yamada, I., in 18th International Conference on Ion Implantation Technology IIT 2010, edited. by Matsuo, J., Kase, M., Aoki, T. and Seki, T., AIP Conference Proceedings 1321, (2010) pp. 1–8.Google Scholar
2. Yamada, I., Matsuo, J., Toyoda, N., and Kirkpatrick, A., Materials Science and Engineering, R34, (2001) pp. 231–295.10.1016/S0927-796X(01)00034-1Google Scholar
3. Goto, K., Matsuo, J., Sugii, T., Minakata, H., Yamada, I., in IEDM Tech Dig. 1996, IEEE, (1996) pp. 435-438.Google Scholar
4. Yamada, I., “Development of Cluster Ion Beam Technology” in IIT school book (2010), edited by Ziegler, J., (Ion Implantation Technology Co. Chester, MD, 2011) pp. 13–1-13-62.Google Scholar
5. Aoki, T., Shimada, N., Takeuchi, D., Matsuo, J., Insepov, Z. and Yamada, I., “The Molecular Dynamics Simulation of Boron Cluster Ion Implantation”, IEICE Technical Report, 96, No.396, (1996) pp. 49–54. (in Japanese).Google Scholar
6. Several papers in 18th International Conference on Ion Implantation Technology IIT 2010, edited by Matsuo, J., Kase, M., Aoki, T. and Seki, T., AIP Conference Proceedings 1321, (2010) and in 10th Workshop on Cluster Ion Beam Technology , Kyoto, (2010).Google Scholar
7. Eggs, C., in 7th Workshop on Cluster Ion Beam Technology, Tokyo, (2006) pp. 46–51.Google Scholar
8. Toyoda, N. and Yamada, I. in 10th Workshop on Cluster Ion Beam Technology, Kyoto, (2010) pp. 75–78.Google Scholar
9. R&D Program & Technology Strategy Map (2007-2010), published by METI Japan. http://www.meti.go.jp/policy/economy/gijutsu_kakushin/kenkyu_kaihatu/str2010.html.Google Scholar
10. Toyoda, N., Nagato, K., Tani, H., Sakane, Y., Nakao, M., Hamaguchi, T., Yamada, I., J. Appl. Phys. 105, (2009) pp. 07C127-1-07C127-2.10.1063/1.3074500Google Scholar
11. Weldon, J., MacCrimmon, R., Caliendo, S., Shao, Y., Hautala, J., Zide, B., Gwinn, M., in 5th Workshop on Cluster Ion Beam Technology, Kyoto, (2004) pp. 47–57.Google Scholar
12. Yamada, I., Brown, W. L., Northby, J. A. and Sosnowski, M., Nucl. Instr.. and Meth. B79, (1993) pp. 223–226.10.1016/0168-583X(93)95330-8Google Scholar
13. Toyoda, N., Kyoto University Ph.D Thesis (1999).Google Scholar
14. Toyoda, N., Matsuo, J., Aoki, T., Chiba, S., Yamada, I., Fenner, D. B. and Tori, R., in Ion Beam Synthesis and Processing of Advanced Materials, edited by Moss, S. C., Heinig, K. and Poker, D., (Mat. Res. Soc. Symp. Proc. 647, Pittsburgh, PA, 2001) pp.O5.1.1–O5.1.6.Google Scholar
15. Ninomiya, S., Ichiki, K., Seki, T., Aoki, T. and Matsuo, J., Nucl. Instr. and Meth. in Phys. Res, B 256, (2007) pp. 493–496.10.1016/j.nimb.2006.12.047Google Scholar
16. Ninomiya, S., Nakata, Y., Ichiki, K., Seki, T., Aoki, T. and Matsuo, J., in 10th Workshop on Cluster Ion Beam Technology, Kyoto, (2010) pp. 43–47.Google Scholar
17. Mochiji, K., Hashinokuchiy, M., Moritani, K. and Toyoda, N., Mass Spectrom. 23, (2009) pp. 648–652.Google Scholar
18. Miyayama, T., Sanada, N., Bryan, S. R., Hammond, J. S. and Suzuki, M., Surf. Interface Anal. 42, (2010) pp. 1453–1457.10.1002/sia.3675Google Scholar
19. Albrektsson, T., Brånemark, P.I., Hansson, H.A., Lindström, J., Acta Orthop. Scand. 52, (1981) pp. 155–70.10.3109/17453678108991776Google Scholar
20. Buser, D., Broggini, N., Wieland, M., Schenk, R.K., Denzer, A.J., Cochran, D.L., Hoffmann, B., Lussi, A. and Steinemann, S.G., J. Dent. Res. 83, (2004) pp. 529–33.10.1177/154405910408300704Google Scholar
21. Suzuki, T., Hori, N., Att, W., Kubo, K., Iwasa, F., Ueno, T., Maeda, H. and Ogawa, T., Tissue Eng Pt A 15, (2009) pp. 3679–3688.10.1089/ten.tea.2008.0568Google Scholar
22. Isogai, H., Toyoda, E., Senda, T., Izunome, K., Kashima, K., Toyoda, N., and Yamada, I., in 16th International Conference on Ion Implantation Technology IIT 2006, edited by Kirkby, K., Gwilliam, R., Smith, A. and Chivers, D., AIP Conference Proceedings 866, (2006) pp. 194–197.Google Scholar
23. Mikos, A.G., Sarakinos, G., Lyman, M.D., Ingber, D.E., Vacanti, J.P., Langer, R., Biotechnol. Bioeng. 42, (1993) pp. 716–23.10.1002/bit.260420606Google Scholar
24. Park, A., Cima, L.G., J. Biomed. Mater Res. 31, (1996) pp. 117–30.10.1002/jbm.1996.820310103Google Scholar
25. Seki, T., Kaneko, T., Takeuchi, D., Aoki, T., Matsuo, J., Insepov, Z., Yamada, I., Nucl. Instr. and Meth in Phys. Res. B. 121, (1997) pp. 498–502.10.1016/S0168-583X(96)00557-5Google Scholar
26. Leseche, G., Ohan, J., Bouttier, S., Palombi, T., Bertrand, P., Andréassian, B., Ann. Vasc. Surg. 9 Suppl., (1995) pp.S15–23.10.1016/S0890-5096(06)60447-0Google Scholar
27. Yeager, A., Callow, A.D., ASAIO Trans. 34, (1988) pp. 88–94.10.1097/00002480-198804000-00003Google Scholar
28. Pu, F.R., Williams, R.L., Markkula, T.K., Hunt, J.A., Biomaterials, 23, (2002) pp. 2411–28.10.1016/S0142-9612(01)00377-5Google Scholar
29. Eddington, D., Puccinelli, J., Beebe, D., Sensors Actuators B-Chem. 114, (2006) pp. 170–172.10.1016/j.snb.2005.04.037Google Scholar