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Cluster Ion Beam Processing: Review of Current and Prospective Applications

Published online by Cambridge University Press:  11 July 2011

Isao Yamada  and
Joseph Khoury
Isao Yamada
Affiliation:
Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, 671-2280 Japan.
Joseph Khoury
Affiliation:
Exogenesis Corporation, 20 Fortune Drive, Billerica, Massachusetts 01821 USA
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Abstract

Cluster ion beam processes which employ ions comprised of a few hundred to several thousand atoms are being developed into a new field of ion beam technology. The processes are characterized by low energy surface interaction effects, lateral sputtering phenomena and high-rate chemical reaction effects. This paper reviews the current status of studies of the fundamental cluster ion beam characteristics as they apply to nanoscale processing and present industrial applications. As new prospective applications, techniques are now being developed to employ cluster ions in surface analysis tools such as XPS and SIMS and to modify surfaces of bio-materials. Results related to these new projects will also be reviewed.

Keywords

biomaterialnanostructureion-solid interactions
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1354: Symposium II – Ion Beams—New Applications from Mesoscale to Nanoscale , 2011 , mrss11-1354-ii03-01
Copyright
Copyright © Materials Research Society 2011

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References

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