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The Chemisorption of Fluorine on Silicon (111) Surfaces

Published online by Cambridge University Press:  22 February 2011

F.R. Mcfeely ,
J. Morar ,
N. D. Shinn ,
G. Landgren ,
F. J. Himpsel  and
Y. Jugnet
F.R. Mcfeely
Affiliation:
IBM T.J. Watson Reseach Center, Box 218, Yorktown Heights, NY 10598, USA
J. Morar
Affiliation:
IBM T.J. Watson Reseach Center, Box 218, Yorktown Heights, NY 10598, USA
N. D. Shinn
Affiliation:
IBM T.J. Watson Reseach Center, Box 218, Yorktown Heights, NY 10598, USA
G. Landgren
Affiliation:
IBM T.J. Watson Reseach Center, Box 218, Yorktown Heights, NY 10598, USA
F. J. Himpsel
Affiliation:
IBM T.J. Watson Reseach Center, Box 218, Yorktown Heights, NY 10598, USA
Y. Jugnet
Affiliation:
IBM T.J. Watson Reseach Center, Box 218, Yorktown Heights, NY 10598, USA
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Abstract

High-resolution, soft x-ray photoemission investigations of fluorine chemisorption on silicon (111) surfaces are reported. The distribution of fluorosilyl moieties was found to be strongly dependent upon the surface structure. The 2×1 reconstruction exhibited only monofluoro species, while the 7×7 showed a distribution of mono-, di-, and trifluorosilyl groups.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 25: Symposium C – Thin Films and Interfaces II , 1983 , 341
Copyright
Copyright © Materials Research Society 1984

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References

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