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Chemical Vapor Synthesis of Nanostructured Ceramics

Published online by Cambridge University Press:  15 February 2011

W. Chang
Affiliation:
Rutgers University, Department of Materials Science, Piscataway, NJ 08854
G. Skandan
Affiliation:
Rutgers University, Department of Materials Science, Piscataway, NJ 08854
H. Hahn
Affiliation:
Technical University of Darmstadt, Department of Materials Science, Germany
S. C. Danforth
Affiliation:
Rutgers University, Department of Ceramic Engineering, Piscataway, NJ 08854
B. Kear
Affiliation:
Rutgers University, Department of Materials Science, Piscataway, NJ 08854
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Abstract

A modification of the conventional inert gas condensation apparatus for making nanostructured powders, wherein as evaporative source is replaced by a chemical source, is described. The new chemical synthetic process, called chemical vapor condensation(CVC), combines rapid thermal decomposition and expansion of a precursor/carrier gas stream in a hot tubular reactor with rapid condensation of the product particle species on a cold substrate under a reduced inert gas pressure of 1-50 mbar. The process has been used to synthesize loosely agglomerated nanoparticles (6 to 10 nm) of n-SiCxNy, starting from hexamethyldisilazane (HMDS) as precursor compound. The phase, morphology, and composition of n-SiCxNy powders can be modified by heat treatment. β-SiC particles with grain size less than 10 nm form after annealing at 1300°C in flowing Ar. In a 1:1 NH3/H2 mixture n-SiCxNy powders transform into α-Si3N4 whiskers, with [100] growth direction.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

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