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The Chemical Vapor Deposition of Dispersed Phase Composites in the B-Si-C-H-Cl-Ar System

Published online by Cambridge University Press:  15 February 2011

T. S. Moss ,
W. J. Lackey  and
G. B. Freeman
T. S. Moss
Affiliation:
Georgia Tech Research Institute, EOEML, Atlanta, GA 30332–0826
W. J. Lackey
Affiliation:
Georgia Tech Research Institute, EOEML, Atlanta, GA 30332–0826
G. B. Freeman
Affiliation:
Georgia Tech Research Institute, EOEML, Atlanta, GA 30332–0826
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Abstract

The CVD of the coatings in the B-Si-C-H-C1-Ar system was accomplished using a statistically designed experiment. The experimental design used five factor half-fraction factorial with a central composite design that was both rotatable and orthogonal. Deposits were thick and dense and were composed of B13C2 and β-SiC with compositions ranging from 0 to 100%. Response surfaces were generated using multivariate regression for unit cell volumes of B13C2 and β-SiC, %B13C2/%SiC in the coating, and the Si to B ratio in the deposit. These equations could then be used to examine the significant variables in the reaction, as well as for tailoring and optimizing the deposition process.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 363 , 1994 , 239
Copyright
Copyright © Materials Research Society 1995

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