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Chemical Analyses of Sol/Gel Surfaces and Thin Films

Published online by Cambridge University Press:  15 February 2011

Carlo G. Pantano ,
C. A. Houser  and
R. K. Brow
Carlo G. Pantano
Affiliation:
Department of Materials Science and Engineering Pennsylvania State University University Park, Pennsylvania 16802, USA
C. A. Houser
Affiliation:
Department of Materials Science and Engineering Pennsylvania State University University Park, Pennsylvania 16802, USA
R. K. Brow
Affiliation:
Department of Materials Science and Engineering Pennsylvania State University University Park, Pennsylvania 16802, USA
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Abstract

The application of surface analysis techniques to the characterization of sol/gel surfaces and thin films is described. Secondary-ion mass spectroscopy (SIMS), x-ray photoelectron spectroscopy (XPS) and sputter-induced photon spectroscopy (SIPS) are used to measure the composition of multicomponent silicate films, the relative water content of alumina films, the nitrogen content of ammonia treated silica films, and the depth profiles for films on black chrome. The determination of chemical structure using XPS and SIMS is also discussed. Finally, a brief introduction to temperature-programmed desorption (TPD) and its potential for studying surface chemical reactions, in situ, is presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 32: Symposium B – Better Ceramics Through Chemistry I , 1984 , 255
Copyright
Copyright © Materials Research Society 1984

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References

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