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Charge Transport in Silicon Nanocrystal Arrays

Published online by Cambridge University Press:  01 February 2011

R. Krishnan
Affiliation:
Dept. of Electrical and Computer Engineering, Univ. of Rochester, Rochester, NY 14627
Q. Xie
Affiliation:
Freescale Semiconductor, APRDL, AZ 85284
J. Kulik
Affiliation:
Freescale Semiconductor, APRDL, AZ 85284
X.D. Wang
Affiliation:
Freescale Semiconductor, APRDL, AZ 85284
T.D. Krauss
Affiliation:
Dept. of Chemistry, Univ. of Rochester, Rochester, NY 14627
P.M. Fauchet
Affiliation:
Dept. of Electrical and Computer Engineering, Univ. of Rochester, Rochester, NY 14627
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Abstract

Single layers of isolated, size-controlled silicon nanocrystals were prepared by thermal crystallization of a thin amorphous silicon layer sandwiched between silicon dioxide layers. A subsequent oxidation treatment ensured controlled increase in their lateral separation. The size of the nanocrystals, separation of the nanocrystals (from < 1 nm to ∼ 4 nm), stoichiometry of the resulting oxide and surface morphology were monitored with transmission electron microscopy, scanning transmission electron microscopy, atomic force microscopy, and x-ray photoelectron spectroscopy. Mesoscopic charge transport studies performed with an electrostatic force microscope (EFM) revealed rapid lateral transport of charges when the nanocrystals were tightly packed (< 1 nm average separation) and interconnected. As the inter-nanocrystal separation was increased, lateral charge transport was rapidly suppressed. Nanocrystals separated by up to 3.6 nm retained the injected charges in a well-defined localized region (∼ 62 nm diameter region) for a time of the order of several days. The ability to switch from a very short to a very long retention time using the same structure by simply changing the post-growth processing conditions is attractive for various applications involving charge transport and localization.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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References

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