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Characterization of TiO2 Thick Films Photoelectrodes Prepared by the Plasma-Spray Coating

Published online by Cambridge University Press:  10 February 2011

N. Kubota ,
M. Ayabe ,
T. Fukuda  and
M. Akashi
N. Kubota
Affiliation:
Research Institute, Ishikawajima-Harima Heavy Industries Co., Ltd. 1, Shin-nakahara-cho, Isogo-ku, Yokohama 235, Japan
M. Ayabe
Affiliation:
Research Institute, Ishikawajima-Harima Heavy Industries Co., Ltd. 1, Shin-nakahara-cho, Isogo-ku, Yokohama 235, Japan
T. Fukuda
Affiliation:
Research Institute, Ishikawajima-Harima Heavy Industries Co., Ltd. 1, Shin-nakahara-cho, Isogo-ku, Yokohama 235, Japan
M. Akashi
Affiliation:
Research Institute, Ishikawajima-Harima Heavy Industries Co., Ltd. 1, Shin-nakahara-cho, Isogo-ku, Yokohama 235, Japan
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Abstract

Semiconducting TiO2 has some photoelectrochemical reactions under ultra-violet irradiation. These photoelectrochemical behaviors studied as possible protection from corrosion. TiO2 thick films were prepared on stainless steel by plasma-spray coating. The film thicknesses were 50∼100μm. The films were characterized by X-ray diffraction, and the diffraction patterns clearly showed a rutile type structure. The crystallization of the films depends on the spray coating conditions. We have investigated the protection properties of the films by measuring the electrode potential. The electrode potential of the films were reduced by about 250m V under ultra-violet irradiation. This potential drop value is sufficient for protection from the corrosion.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 458: Symposium W – Interfacial Engineering for Optimized Properties , 1996 , 449
Copyright
Copyright © Materials Research Society 1997

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References

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