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Characterization of the Mechanical and Tribological Properties of Sputtered a:SiC Thin Films

Published online by Cambridge University Press:  15 February 2011

T. W. Scharf ,
R. B. Inturi  and
J. A. Barnard
T. W. Scharf
Affiliation:
Department of Metallurgical and Materials Engineering, The University of Alabama, Tuscaloosa, AL 35487–0202.
R. B. Inturi
Affiliation:
Department of Metallurgical and Materials Engineering, The University of Alabama, Tuscaloosa, AL 35487–0202.
J. A. Barnard
Affiliation:
Department of Metallurgical and Materials Engineering, The University of Alabama, Tuscaloosa, AL 35487–0202.
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Abstract

D.C. magnetron sputtering from a CVD β-SiC target has been utilized to deposit amorphous SiC thin films on various substrates (Coming 7059 glass, unoxidized Si (111), and sapphire). The approximately 1 μm thick films were grown under various Ar sputtering pressures and flow rates. In situ annealing during deposition in vacuum and ex situ post-deposition annealing in air, both at 500°C for two hours, were implemented to determine their effects on the properties of the films. The mechanical properties were assessed via nanoindentation. An accelerated sphere-on-flat(tape) wear tester was administered to measure the wear volume losses and resultant wear rates under 0.1 and 0.2N loads, a 0.024m/s tape speed, and a 1mm ruby sphere diameter. An atomic force microscope (AFM) established the wear scar volume losses as well as the surface arithmetic roughness (RA) and root mean square roughness (RMS) of the films. The amorphous microstructure was verified by X-ray diffractometry. There was a decreasing trend in the plastic contact damage resistance, hardness, elastic modulus, and wear resistance of the films with increased amounts of Ar gas pressure; on the other hand, annealing of the lower Ar content films generated an increase in these properties compared to the as-deposited films. Atomic force microscopy revealed a more pronounced change in surface features and roughness for the in situ annealed films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 436: Symposium CC – Thin Films Stresses and Mechanical Properties VI , 1996 , 311
Copyright
Copyright © Materials Research Society 1997

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References

1. Philipp, H.P. and Taft, E.A., in Silicon Carbide. A High Temperature Semiconductor, edited by O'Connor, J.R. and Smiltens, J. (Pergamon Press, New York, 1960), p. 371.Google Scholar
2. Cha, Y.H.C., Jou, S., Prakash, S., Doerr, H.J. and Bunshah, R.F., Mat. Sci. & Eng. A 163, 207 (1993).Google Scholar
3. Cha, Y.H.C., Doerr, H.J., and Bunshah, R.F., Surf. Coat. Technol. 62, 697 (1993).Google Scholar
4. Bullot, J. and Schmidt, M.P., Phys. Status Solidi, B143, 345 (1987).Google Scholar
5. Chaker, M., Boily, S., Diawara, Y., Khakani, M.A. El, Gat, E., Jean, A., Lafontaine, H., Pepin, H., Voyer, J., Kiefer, J.C., Haghiri-Gosnet, A.M., Ladan, F.R., Ravet, M.F., Chen, Y., and Rousseaux, F., J. Vac. Sci. Technol. B10 (6), 3191 (1992).Google Scholar
6. Zehnder, T., Blatter, A., Burger, J., Julia-Schmutz, C., and Christoph, R., in Tribological Properties of Laser Deposited SiC Coatings, edited by Barmak, K., Parker, M.A., Floro, J.A., Sinclair, R., and Smith, D.A. (Mater. Res. Soc. Proc. 343, Pittsburgh, PA, 1994), p.621 Google Scholar
7. Meneve, J., Jacobs, R., Lostak, F., Eersels, L., Dekempeneer, E., and Smeets, J., in Micromechanical Behaviour of Amorphous Hydrogenated Silicon Carbide Films, edited by Townsend, P.H., Weihs, T.P., Sinclair, J.E. Jr., and Borgesen, P. (Mat. Res. Soc. Symp. Proc. 308, Pittsburgh, PA, 1993), p.671.Google Scholar
8. Gupta, B.K. and Bhushan, B., IEEE Trans. on Magn. 31 (6), 3012 (1995).Google Scholar
9. Loboda, M.J. and Ferber, M.K., J. Mater. Res. 8, 2908 (1993).Google Scholar
10. Oliver, W.C. and Pharr, G.M., J. Mater. Res. 7, 1564 (1992).Google Scholar
11. Deng, H., Inturi, V.R., and Barnard, J. A., in Mechanical Properties and Wear Resistance of High Moment Thin Film Head Materials, edited by Baker, S.P., Ross, C.A., Townsend, P.H., Volkert, C.A., and Borgesen, P. (Mater. Res. Soc. Proc. 356, Pittsburgh, PA, 1995) pp. 773.Google Scholar
12. Mogab, C.J. and Kingery, W.D., J. App. Phys. 39, 3640 (1968).Google Scholar
13. Wasa, K., Nagai, T., and Hayakawa, S., Thin Solid Films 31, 235 (1976).Google Scholar
14. Hirohata, Y., Nemoto, Y., Hino, T., and Yamashina, T., Thin Solid Films 214, 150 (1992).Google Scholar
15. Tsui, T.Y., Pharr, G.M., Oliver, W.C., Chung, Y.W., Cutiongco, E.C., Bhatia, C.S., White, R.L., Rhoades, R.L., Gorbatkin, S.M., in Nanoindentation and Nanoscratching of Hard Coating Materials for Magnetic Disks, edited by Baker, S.P., Ross, C.A., Townsend, P.H., Volkert, C.A., and Borgesen, P. (Mat. Res. Soc. Symp. Proc. 356, Pittsburgh, PA, 1995), p.767.Google Scholar
16. El-Khakani, M.A., Chaker, M., Jean, A., Boily, S., Kieffer, J.C., O'Hern, M.E., Ravet, M.F., and Rousseaux, F., J. Mater. Res. 9, 96 (1994).Google Scholar
17. Wang, H., Singh, R.N., and Goela, J.S., J. Amer. Cer. Soc. 78, 2437 (1995).Google Scholar
18. Ojha, S.M., in Physics of Thin Films 12, edited by Hass, G., Francombe, M.H., and Vossen, J.L. (Academic Press, Inc., New York, 1982), p.273.Google Scholar
19. Deng, H., Chen, J., Inturi, R.B., and Barnard, J.B., Surf. Coat. Technol. 76–77, 609 (1995).Google Scholar