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Characterization Of Amorphous Carbon Films Based On Carbon, Nitrogen, and hydrogen*.

Published online by Cambridge University Press:  10 February 2011

H. Efstathiadis ,
Z. Akkerman  and
F. W. Smith
H. Efstathiadis
Affiliation:
Physics Department, City College of New York, New York, NY 10031.
Z. Akkerman
Affiliation:
Physics Department, City College of New York, New York, NY 10031.
F. W. Smith
Affiliation:
Physics Department, City College of New York, New York, NY 10031.
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Abstract

A series of amorphous hydrogenated carbon-nitrogen alloy films (a-CxNyHz) has been prepared via plasma-enhanced chemical vapor deposition from mixtures of nitrogen and acetylene. It is found that as the ratio R=N2/C2H2 is increased from zero to 100, the nitrogen incorporation into the films is increasing while the deposition rate is decreasing for 0<R<10 and is saturating at a value of about 1.0 A/sec for 10<R<100. The absorption associated with the N-H stretching mode increases while that of the C-H stretching mode decreases with increase of R. The optical constants and the energy gaps of these films have also been determined. A free energy model previously developed for the prediction of the bonding in amorphous a-CxHyalloys is extended and applied here to a-CxNyHz. Predictions are presented for the bonding of tetrahedral C(sp3), trigonal C(sp2), linear C(sp1), pyramidal N(sp 3), trigonal N(sp 2), and linear N(sp1) atoms in the alloy, and the bonding of H to these atoms.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 415: Symposium BB – Metal-Organic Chemical Vapor Deposition of Electronic Ceramics II , 1995 , 51
Copyright
Copyright © Materials Research Society 1996

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References

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