Hostname: page-component-586b7cd67f-2plfb Total loading time: 0 Render date: 2024-11-23T14:25:41.722Z Has data issue: false hasContentIssue false

Characterization and Fabrication of InGaN-based Blue LED with Underlying AlGaN/GaN SLS Cladding Layer Grown on Si(111) Substrate

Published online by Cambridge University Press:  31 January 2011

Bin Abu Bakar Ahmad Shuhaimi
Affiliation:
[email protected], Nagoya Institute of Technology, Research Center for Nano-Device and System, Nagoya, Aichi, Japan
Chian Khai Pum
Affiliation:
[email protected], Nagoya Institute of Technology, Research Center for Nano-Device and System, Nagoya, Aichi, Japan
Takaaki Suzue
Affiliation:
[email protected], Nagoya Institute of Technology, Research Center for Nano-Device and System, Nagoya, Aichi, Japan
Yukiyasu Nomura
Affiliation:
[email protected], Nagoya Institute of Technology, Research Center for Nano-Device and System, Nagoya, Aichi, Japan
Takashi Egawa
Affiliation:
[email protected], Nagoya Institute of Technology, Research Center for Nano-Device and System, Nagoya, Aichi, Japan
Get access

Abstract

This paper reports improved optical characteristics of InGaN-based light-emitting-diode (LED) grown on Si(111) substrate by the insertion of an Al0.06Ga0.94N/GaN strained-layer-superlattices (SLS) cladding layer after AlN/GaN multilayer (ML) growth, under the multi-quantum-well (MQW) active layer. The insertion of underlying Al0.06Ga0.94N/GaN SLS cladding layer has shown to improve epitaxial layer quality in x-ray diffraction (XRD) analysis, reduce wavelength peak fluctuations in photoluminescence (PL) surface mapping, and improve optical and electrical characteristics of the LED sample. A 34% increase of light intensity at 50 mA current injection and a narrower wavelength peak have been achieved by the insertion of Al0.06Ga0.94N/GaN SLS cladding layer. LED with underlying Al0.06Ga0.94N/GaN also shows superior current-voltage (I-V) characteristics with operation voltage of 3.2 V at 20 mA and series resistance of 16 Ω.

Keywords

Type
Research Article
Copyright
Copyright © Materials Research Society 2009

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Egawa, T. Zhang, B. Nishikawa, N. Ishikawa, H. Jimbo, T. and Umeno, M. J. Appl. Phys. 91, 528(2002).Google Scholar
2 Ishikawa, H. Asano, K. Zhang, B. Egawa, T. and Jimbo, T. Phys. Stat. Sol. (a) 201, 2653(2004).Google Scholar
3 Shuhaimi, B. A. B. Ahmad, Suzue, T. Nomura, Y. Maki, Y. and Egawa, T. MRS Spring Meeting 2009 O2.5, San Francisco (2009).Google Scholar
4 Zhang, B. J. Egawa, T. Ishikawa, H. Nishikawa, N. Jimbo, T. and Umeno, M. Phys. Stat. Sol. (a) 188, 151(2001).Google Scholar
5 Zhang, B. Egawa, T. Liu, Y. H. Ishikawa and Jimbo, T. Phys. Stat. Sol. (c) 0, 2244(2003).Google Scholar