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Carrier Removal in n+ GaAs:Si by Proton Implantation. a Spectroscopic Study
Published online by Cambridge University Press: 26 February 2011
Abstract
Protons and deuterons have been implanted in n+ GaAs:Si epilayers. Localized vibrational modes (LVM's) associated to H- and D-related defects are observed in the as-implanted samples and they account presumably for the carrier removal in the compensated region, but a small concentration of Si-H passivating centers is already present. LVM spectroscopy shows that after a 200° C annealing, passivation predominates over compensation while a 400° C annealing extends partial passivation throughout the layer.
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- Copyright © Materials Research Society 1988
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