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Boltzmann Transport Equation Analysis of Ion Implantation Range and Damage Distributions

Published online by Cambridge University Press:  25 February 2011

James F. Gibbons
Affiliation:
Stanford Electronics Laboratories, Stanford, CA 94305
Lee A. Christel
Affiliation:
SERA Solar Corporation, Santa Clara, CA 95050
Martin D. Giles
Affiliation:
Bell Laboratories, Murray Hill, NJ 07974.
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Abstract

The Boltzmann transport equation has been used to calculate range anddamage distributions in multilayer targets of general interest for semiconductor fabrication. A comprehensive review of the calculations will be presented, with particular emphasis on how large angle scattering events and channeling phenomena may be included. Examples of the quality of fit between the theory and experiment show that difficult phenomena (such as residual channeling) can be reasonable modelled.

Type
Research Article
Copyright
Copyright © Materials Research Society 1985

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Footnotes

Paper presented in symposium but not published.

References

Paper presented in symposium but not published.