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Block Copolymer Thin Films Above and Below the Order-Disorder Transition Temperature

Published online by Cambridge University Press:  01 February 2011

Ratchana Limary  and
Peter F. Green
Ratchana Limary
Affiliation:
Dept. of Chemical Engineering and the Graduate Program in Materials Science, The University of Texas at Austin, Austin, TX
Peter F. Green
Affiliation:
Dept. of Chemical Engineering and the Graduate Program in Materials Science, The University of Texas at Austin, Austin, TX
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Abstract

Symmetric diblock copolymers undergo a disorder to order transition below a microphase separation transition temperature. In this temperature range the structure is characterized by alternating lamellae of thickness L. In thin film geometries, the lamellae are oriented normal to the substrate if there is a preferential interaction between either of the block constituents and the substrate/copolymer or copolymer/vacuum interfaces. Depending on the relation between the film thickness and L, the topography of the film might comprise of holes, islands or spinodal-like structures. We show that in a polystyrene-b-poly(methyl methacrylate) diblock copolymer of molecular weight 20, 000 g/mol, above the microphase separation transition temperature, the topography of the film depends on the thickness. A heirarchy of bicontinuous patterns and holes is observed with increasing film thickness for films thinner than 35 nm.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 629: Symposium FF – Interfaces, Adhesion and Processing in Polymer Systems , 2000 , FF1.5
Copyright
Copyright © Materials Research Society 2000

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